JPS5527351A - Stabilization of halogen-containing polymer - Google Patents

Stabilization of halogen-containing polymer

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Publication number
JPS5527351A
JPS5527351A JP10047578A JP10047578A JPS5527351A JP S5527351 A JPS5527351 A JP S5527351A JP 10047578 A JP10047578 A JP 10047578A JP 10047578 A JP10047578 A JP 10047578A JP S5527351 A JPS5527351 A JP S5527351A
Authority
JP
Japan
Prior art keywords
containing polymer
weight
parts
residue
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10047578A
Other languages
Japanese (ja)
Inventor
Toshio Kano
Akio Fukuda
Yoshitaka Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyodo Chemical Co Ltd
Original Assignee
Kyodo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyodo Chemical Co Ltd filed Critical Kyodo Chemical Co Ltd
Priority to JP10047578A priority Critical patent/JPS5527351A/en
Publication of JPS5527351A publication Critical patent/JPS5527351A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To prevent the discoloration of a chlorine-containing polymer in the heat molding, by adding a specific organo-tin compound together with a derivative of boric acid or phenylboric acid.
CONSTITUTION: A stabilized composition composed of (A) 100 parts by weight of a halogen-containing polymer such as polyvinyl chloride, polyvinylidene chloride, etc., (B) 0.05W10 parts by weight of an organo-tin compound of formula I [R1,2 are 1W18C alkyl; at least one of the X and Y is acyl residue or mercaptan residue, one of which is II (Z is O, S or diacyloxyalkylene group such as maleic acid residue)] and (C) 0.1W10 parts by weight of a derivative of boric acid or phenylboric acid of formula III (R1 is hydroxy, phenyl, etc.; R2W5 are H, hydroxy, etc.; X is S or a 1W4C alkylene group or benzylidene group which connects two benzene rings with a single carbon atom).
COPYRIGHT: (C)1980,JPO&Japio
JP10047578A 1978-08-18 1978-08-18 Stabilization of halogen-containing polymer Pending JPS5527351A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10047578A JPS5527351A (en) 1978-08-18 1978-08-18 Stabilization of halogen-containing polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10047578A JPS5527351A (en) 1978-08-18 1978-08-18 Stabilization of halogen-containing polymer

Publications (1)

Publication Number Publication Date
JPS5527351A true JPS5527351A (en) 1980-02-27

Family

ID=14274929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10047578A Pending JPS5527351A (en) 1978-08-18 1978-08-18 Stabilization of halogen-containing polymer

Country Status (1)

Country Link
JP (1) JPS5527351A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989006257A1 (en) * 1988-01-11 1989-07-13 M & T Chemicals, Inc. Stabilizer compositions for halogen-containing polymers
KR100680403B1 (en) 2003-10-06 2007-02-08 주식회사 하이닉스반도체 Photoresist Polymer and Photoresist Composition Comprising the Same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989006257A1 (en) * 1988-01-11 1989-07-13 M & T Chemicals, Inc. Stabilizer compositions for halogen-containing polymers
KR100680403B1 (en) 2003-10-06 2007-02-08 주식회사 하이닉스반도체 Photoresist Polymer and Photoresist Composition Comprising the Same

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