JPS5529708A - Contactless film thickness measuring unit - Google Patents
Contactless film thickness measuring unitInfo
- Publication number
- JPS5529708A JPS5529708A JP10145378A JP10145378A JPS5529708A JP S5529708 A JPS5529708 A JP S5529708A JP 10145378 A JP10145378 A JP 10145378A JP 10145378 A JP10145378 A JP 10145378A JP S5529708 A JPS5529708 A JP S5529708A
- Authority
- JP
- Japan
- Prior art keywords
- light
- film thickness
- reflected
- light flux
- reaches
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004907 flux Effects 0.000 abstract 7
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
PURPOSE: To perform an on-line measurement of each film thickness of a multilayer transmission material continuously without contact by using a Michelson interference meter utilizing a white light.
CONSTITUTION: The light from light source 1 becomes a parallel light and reaches beam splitter 3 and is divided into light fluxes R1 and R2. Light flux R1 is incident onto sample 4 and is reflected by fixed mirror 6 and reaches detector 11. At this time, since light flux R1 is reflected for every film layer face of measured sample 4, the light incident onto detector 11 becomes composite light fluxes defferent in phase. The other divided light flux R2 is reflected by movable mirror 7 and reaches detector 11 through beam splitter 3. Movable mirror 7 is positioned by differential transformer 10 and is driven by speaker 9 while being prevented from transversal vibration by air bearing 8. Then, since a light path difference is generated in light flux R2, the film thickness of each layer can be detected by measuring the interference geterated between light fluxes R1 and R2.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10145378A JPS5529708A (en) | 1978-08-22 | 1978-08-22 | Contactless film thickness measuring unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10145378A JPS5529708A (en) | 1978-08-22 | 1978-08-22 | Contactless film thickness measuring unit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5529708A true JPS5529708A (en) | 1980-03-03 |
Family
ID=14301106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10145378A Pending JPS5529708A (en) | 1978-08-22 | 1978-08-22 | Contactless film thickness measuring unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5529708A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5220405A (en) * | 1991-12-20 | 1993-06-15 | International Business Machines Corporation | Interferometer for in situ measurement of thin film thickness changes |
| CN111336932A (en) * | 2018-12-18 | 2020-06-26 | 天津大学 | Microscopic differential reflection spectrum measuring system and method for measuring thickness of nano film |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5010509A (en) * | 1973-05-24 | 1975-02-03 |
-
1978
- 1978-08-22 JP JP10145378A patent/JPS5529708A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5010509A (en) * | 1973-05-24 | 1975-02-03 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5220405A (en) * | 1991-12-20 | 1993-06-15 | International Business Machines Corporation | Interferometer for in situ measurement of thin film thickness changes |
| CN111336932A (en) * | 2018-12-18 | 2020-06-26 | 天津大学 | Microscopic differential reflection spectrum measuring system and method for measuring thickness of nano film |
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