JPS5534437A - Method of forming minute pattern - Google Patents

Method of forming minute pattern

Info

Publication number
JPS5534437A
JPS5534437A JP10666178A JP10666178A JPS5534437A JP S5534437 A JPS5534437 A JP S5534437A JP 10666178 A JP10666178 A JP 10666178A JP 10666178 A JP10666178 A JP 10666178A JP S5534437 A JPS5534437 A JP S5534437A
Authority
JP
Japan
Prior art keywords
inclined planes
rays
substrate
extensional
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10666178A
Other languages
Japanese (ja)
Inventor
Yoshiharu Ichida
Eiji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10666178A priority Critical patent/JPS5534437A/en
Publication of JPS5534437A publication Critical patent/JPS5534437A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To form non-exposure minute patterns corresponding to inclined planes, by mounting level difference portions, in which the inclined planes exist in extensional shapes, to pattern form that must be made up on a flat surface of transparent glass, and by totally reflecting transmitted light on the inclined planes.
CONSTITUTION: A mask 1 in transparent glass, in which inclined planes exist in extensional shapes in pattern form that must be built up, is contacted with a substrate 4 spain coated with a photo-resist 3, and both are contact printed. Rays of light incident striking against the inclined planes at that time are totally reflected on the inclined planes as rays 5a and do not reach the substrate 4, and non-exposure patterns 3a appear. In the flat portions of the glass substrate 1 except the inclined planes, rays of light incident reach the resist 3 without being reflected as rays 5b, and are exposed. Thus, minute patterns in sub-micron can be formed in excellent reproducibility.
COPYRIGHT: (C)1980,JPO&Japio
JP10666178A 1978-08-31 1978-08-31 Method of forming minute pattern Pending JPS5534437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10666178A JPS5534437A (en) 1978-08-31 1978-08-31 Method of forming minute pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10666178A JPS5534437A (en) 1978-08-31 1978-08-31 Method of forming minute pattern

Publications (1)

Publication Number Publication Date
JPS5534437A true JPS5534437A (en) 1980-03-11

Family

ID=14439264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10666178A Pending JPS5534437A (en) 1978-08-31 1978-08-31 Method of forming minute pattern

Country Status (1)

Country Link
JP (1) JPS5534437A (en)

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