JPS5538510A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5538510A
JPS5538510A JP11077278A JP11077278A JPS5538510A JP S5538510 A JPS5538510 A JP S5538510A JP 11077278 A JP11077278 A JP 11077278A JP 11077278 A JP11077278 A JP 11077278A JP S5538510 A JPS5538510 A JP S5538510A
Authority
JP
Japan
Prior art keywords
photosensitive composition
diazonium salt
weight
salt
aromatic diazonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11077278A
Other languages
Japanese (ja)
Other versions
JPS6150302B2 (en
Inventor
Hajime Morishita
Saburo Nonogaki
Toshikatsu Manabe
Masaichi Uchino
Shoko Nishizawa
Hiroshi Yokomizo
Yoshifumi Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11077278A priority Critical patent/JPS5538510A/en
Publication of JPS5538510A publication Critical patent/JPS5538510A/en
Publication of JPS6150302B2 publication Critical patent/JPS6150302B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE: To obtain the photosensitive composition which is suited for the manufacture of the fluorescent surface of color braun tubes in particular, is good in shelf life and low in cost by containing aromatic diazonium salt and the specific chelating agent.
CONSTITUTION: Aromatic diazonium salt such as 4-dimethyl aminobenzene diazonium chloride-(1).zinc chloride double salts, etc. and 0.05W2, preferably 0.2W 1.0wt%, based on the weight of this salt, of the chelating agent such as, e.g., ethylene diamine tetraacetic acid having 2 or more acetic acid groups in one molecule are contained together with 0.5W500, preferably 7W50wt%, based on the weight of the aromatic diazonium salt, of an organic high polymer compound such as polyvinyl alcohol or other, in the photosensitive composition. To this photosensitive composition is added 0.01W1wt%, based on the weight of the diazonium salt, of surfactants to imorove coating characteristic. This photosensitive composition is advantageous in cost and workability in that it is substantially an aqueous solution.
COPYRIGHT: (C)1980,JPO&Japio
JP11077278A 1978-09-11 1978-09-11 Photosensitive composition Granted JPS5538510A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11077278A JPS5538510A (en) 1978-09-11 1978-09-11 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11077278A JPS5538510A (en) 1978-09-11 1978-09-11 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5538510A true JPS5538510A (en) 1980-03-18
JPS6150302B2 JPS6150302B2 (en) 1986-11-04

Family

ID=14544188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11077278A Granted JPS5538510A (en) 1978-09-11 1978-09-11 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS5538510A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579036A (en) * 1980-06-20 1982-01-18 Hitachi Ltd Formation of pattern by using photosensitive compound
JPS5883846A (en) * 1981-11-14 1983-05-19 Konishiroku Photo Ind Co Ltd Metallic image forming material
JPS59151149A (en) * 1983-02-15 1984-08-29 Toshiba Corp Photoresist composition
JPS6028648A (en) * 1983-07-26 1985-02-13 Nippon Seihaku Kk Photosensitive resin composition
JPS61246494A (en) * 1985-04-17 1986-11-01 チバ―ガイギー　アクチエンゲゼルシヤフト Stable solution of exposure crossed coupling polymer precursor of polymer having heat resistance to high degree
JPS62262856A (en) * 1986-05-09 1987-11-14 Kansai Paint Co Ltd Electrodeposition paint composition for photoresist of printed circuit

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0334302U (en) * 1989-08-10 1991-04-04

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579036A (en) * 1980-06-20 1982-01-18 Hitachi Ltd Formation of pattern by using photosensitive compound
JPS5883846A (en) * 1981-11-14 1983-05-19 Konishiroku Photo Ind Co Ltd Metallic image forming material
JPS59151149A (en) * 1983-02-15 1984-08-29 Toshiba Corp Photoresist composition
JPS6028648A (en) * 1983-07-26 1985-02-13 Nippon Seihaku Kk Photosensitive resin composition
JPS61246494A (en) * 1985-04-17 1986-11-01 チバ―ガイギー　アクチエンゲゼルシヤフト Stable solution of exposure crossed coupling polymer precursor of polymer having heat resistance to high degree
JPS62262856A (en) * 1986-05-09 1987-11-14 Kansai Paint Co Ltd Electrodeposition paint composition for photoresist of printed circuit

Also Published As

Publication number Publication date
JPS6150302B2 (en) 1986-11-04

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