JPS5540477A - Production of diffraction grating - Google Patents
Production of diffraction gratingInfo
- Publication number
- JPS5540477A JPS5540477A JP11393378A JP11393378A JPS5540477A JP S5540477 A JPS5540477 A JP S5540477A JP 11393378 A JP11393378 A JP 11393378A JP 11393378 A JP11393378 A JP 11393378A JP S5540477 A JPS5540477 A JP S5540477A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- films
- diffraction grating
- glass
- polished
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 abstract 4
- 239000011521 glass Substances 0.000 abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005498 polishing Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
PURPOSE: To enable the diffraction grating having the grooves of nearly desired shapes to be created by cutting and polishing the multilayer films laminated with the specific dielectric films in the film thickness direction then etching the polished surfaces.
CONSTITUTION: SiO2 and B2O3 are simultaneously evaporated toward a glass substrate 4 from vapor sources 5, 6 in a vacuum vessel, whereby SiO2-B2O3 glass is formed on the substrate 4. At this time the composition of the glass is so controlled as to become the concentrations shown in the figure, thus the galss films 7 of 1000 or more layers whose concentrations change periodically are formed. Next, the substrate 4 is withdrawn from the vacuum system and is cut and polished in the direction perpendicular to the films 7. Thereafter, the substrate 4 with its polished surface 10 being faced downward is dipped in the hydrofluoric acid of the etching solution, whereby the surface 10 is etched according to the concentrations of the composition B2O3 which is easy to be etched. As a result, the diffraction grating formed with the grooves 11 having the saw tooth form section as illustrated is obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11393378A JPS5540477A (en) | 1978-09-14 | 1978-09-14 | Production of diffraction grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11393378A JPS5540477A (en) | 1978-09-14 | 1978-09-14 | Production of diffraction grating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5540477A true JPS5540477A (en) | 1980-03-21 |
Family
ID=14624823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11393378A Pending JPS5540477A (en) | 1978-09-14 | 1978-09-14 | Production of diffraction grating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5540477A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1105927C (en) * | 1997-07-15 | 2003-04-16 | 三星电子株式会社 | Fabrication method for uniform planar optical waveguide |
| CN103645533A (en) * | 2013-12-13 | 2014-03-19 | 聊城大学 | Preparing method of nanoscale optical grating |
-
1978
- 1978-09-14 JP JP11393378A patent/JPS5540477A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1105927C (en) * | 1997-07-15 | 2003-04-16 | 三星电子株式会社 | Fabrication method for uniform planar optical waveguide |
| CN103645533A (en) * | 2013-12-13 | 2014-03-19 | 聊城大学 | Preparing method of nanoscale optical grating |
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