JPS5541731A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5541731A JPS5541731A JP11444178A JP11444178A JPS5541731A JP S5541731 A JPS5541731 A JP S5541731A JP 11444178 A JP11444178 A JP 11444178A JP 11444178 A JP11444178 A JP 11444178A JP S5541731 A JPS5541731 A JP S5541731A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- barrier metal
- metallic
- semiconductor device
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To provide a semiconductor device which is made to have excellent electrical properties and stability by providing a barrier metal layer having an oxidized surface between a semiconductor substrate and a metallic wiring layer or between the metallic wiring layer and an externally leading electrode protrusion.
CONSTITUTION: An electrode contacting hole is provided in an insulation film 2 formed on the surface of a silicon substrate 1. A barrier metal 3 prepared of a metal of high melting point, such as chrome, in the form of powder so as to have a much greater surface area with an oxidized film due to previous exposure to air is evaporated onto an electrode portion in the substrate 1 by the E-gun techniques to form a first metallic layer. A second metallic layer 4 which is used for wiring and composed of aluminum or the like is evaporation-formed over an area covering the barrier metal portion 3 and part of the insulation film 2 as far as the electrode portion, followed by heat treatment, to finally obtain a semiconductor device having a high efficiency and excellent stability.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53114441A JPS59131B2 (en) | 1978-09-18 | 1978-09-18 | semiconductor equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53114441A JPS59131B2 (en) | 1978-09-18 | 1978-09-18 | semiconductor equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5541731A true JPS5541731A (en) | 1980-03-24 |
| JPS59131B2 JPS59131B2 (en) | 1984-01-05 |
Family
ID=14637804
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53114441A Expired JPS59131B2 (en) | 1978-09-18 | 1978-09-18 | semiconductor equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59131B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4948754A (en) * | 1987-09-02 | 1990-08-14 | Nippondenso Co., Ltd. | Method for making a semiconductor device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6482547A (en) * | 1987-09-24 | 1989-03-28 | Tadahiro Omi | Semiconductor device |
-
1978
- 1978-09-18 JP JP53114441A patent/JPS59131B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4948754A (en) * | 1987-09-02 | 1990-08-14 | Nippondenso Co., Ltd. | Method for making a semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59131B2 (en) | 1984-01-05 |
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