JPS5543821A - Electronic drawing device - Google Patents

Electronic drawing device

Info

Publication number
JPS5543821A
JPS5543821A JP11596078A JP11596078A JPS5543821A JP S5543821 A JPS5543821 A JP S5543821A JP 11596078 A JP11596078 A JP 11596078A JP 11596078 A JP11596078 A JP 11596078A JP S5543821 A JPS5543821 A JP S5543821A
Authority
JP
Japan
Prior art keywords
light
deflection
polarizing
electrostatic
electromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11596078A
Other languages
Japanese (ja)
Inventor
Teiji Katsuta
Hideyuki Kakiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11596078A priority Critical patent/JPS5543821A/en
Publication of JPS5543821A publication Critical patent/JPS5543821A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable an electromagnetic-electrostatic compound light-polarizing type drawing device to indicate and observe images detected by 2 light-polarizing step on a CRT at a time so that the 2 polarized light axes can be perfectly adjusted while visually observing the highly magnified images. CONSTITUTION:An electronic beam 2 from an electronic gun 1 is slimly gathered by gathering lenses 3 and 5 and the beam is spotted on a test piece 12 by a projection lens 9. This is scanned and blanked by an electrostaitc light-polarizing devices 7 and 8 and electromagnetic light-polarizing device 10 and 11 and also a blanking plate 4 in order to have a required sketch (or pattern) drawn. And a small block, e.g. 100mum<2>, is deflection-exposed by electrostatic deflection through respectively independent precision rotary machanismes. A scanning image by electrostatic deflection and a scanning image by electromagnetic deflection are simultaneously indicated on a CRT 25, and rotation of an electrostatic light-polarizing board is adjusted so that XY axes of the electromagnetic deflection and the electrostatic deflection agree with each other.
JP11596078A 1978-09-22 1978-09-22 Electronic drawing device Pending JPS5543821A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11596078A JPS5543821A (en) 1978-09-22 1978-09-22 Electronic drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11596078A JPS5543821A (en) 1978-09-22 1978-09-22 Electronic drawing device

Publications (1)

Publication Number Publication Date
JPS5543821A true JPS5543821A (en) 1980-03-27

Family

ID=14675388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11596078A Pending JPS5543821A (en) 1978-09-22 1978-09-22 Electronic drawing device

Country Status (1)

Country Link
JP (1) JPS5543821A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06244179A (en) * 1993-11-15 1994-09-02 Hitachi Ltd IC element correction method
JPH06244178A (en) * 1993-11-15 1994-09-02 Hitachi Ltd Ic processing device
JPH06244177A (en) * 1993-11-15 1994-09-02 Hitachi Ltd Method for modifying ic
JPH08153721A (en) * 1995-04-26 1996-06-11 Hitachi Ltd Method and device for correcting IC element

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5093571A (en) * 1973-12-19 1975-07-25
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5093571A (en) * 1973-12-19 1975-07-25
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06244179A (en) * 1993-11-15 1994-09-02 Hitachi Ltd IC element correction method
JPH06244178A (en) * 1993-11-15 1994-09-02 Hitachi Ltd Ic processing device
JPH06244177A (en) * 1993-11-15 1994-09-02 Hitachi Ltd Method for modifying ic
JPH08153721A (en) * 1995-04-26 1996-06-11 Hitachi Ltd Method and device for correcting IC element

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