JPS5543872A - Insulating gate field effect transistor - Google Patents
Insulating gate field effect transistorInfo
- Publication number
- JPS5543872A JPS5543872A JP11697878A JP11697878A JPS5543872A JP S5543872 A JPS5543872 A JP S5543872A JP 11697878 A JP11697878 A JP 11697878A JP 11697878 A JP11697878 A JP 11697878A JP S5543872 A JPS5543872 A JP S5543872A
- Authority
- JP
- Japan
- Prior art keywords
- base
- oxide film
- drain
- channel region
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005669 field effect Effects 0.000 title 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11697878A JPS5543872A (en) | 1978-09-22 | 1978-09-22 | Insulating gate field effect transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11697878A JPS5543872A (en) | 1978-09-22 | 1978-09-22 | Insulating gate field effect transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5543872A true JPS5543872A (en) | 1980-03-27 |
Family
ID=14700455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11697878A Pending JPS5543872A (en) | 1978-09-22 | 1978-09-22 | Insulating gate field effect transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5543872A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4571609A (en) * | 1980-06-16 | 1986-02-18 | Tokyo Shibaura Denki Kabushiki Kaisha | Stacked MOS device with means to prevent substrate floating |
| US5027177A (en) * | 1989-07-24 | 1991-06-25 | Hughes Aircraft Company | Floating base lateral bipolar phototransistor with field effect gate voltage control |
| US5294821A (en) * | 1990-10-09 | 1994-03-15 | Seiko Epson Corporation | Thin-film SOI semiconductor device having heavily doped diffusion regions beneath the channels of transistors |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48101887A (ja) * | 1972-04-01 | 1973-12-21 |
-
1978
- 1978-09-22 JP JP11697878A patent/JPS5543872A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48101887A (ja) * | 1972-04-01 | 1973-12-21 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4571609A (en) * | 1980-06-16 | 1986-02-18 | Tokyo Shibaura Denki Kabushiki Kaisha | Stacked MOS device with means to prevent substrate floating |
| US5027177A (en) * | 1989-07-24 | 1991-06-25 | Hughes Aircraft Company | Floating base lateral bipolar phototransistor with field effect gate voltage control |
| US5294821A (en) * | 1990-10-09 | 1994-03-15 | Seiko Epson Corporation | Thin-film SOI semiconductor device having heavily doped diffusion regions beneath the channels of transistors |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5742164A (en) | Semiconductor device | |
| JPS55133574A (en) | Insulated gate field effect transistor | |
| JPS5688354A (en) | Semiconductor integrated circuit device | |
| JPS5688363A (en) | Field effect transistor | |
| JPS55151363A (en) | Mos semiconductor device and fabricating method of the same | |
| JPS55146976A (en) | Insulating gate field effect transistor | |
| JPS55121682A (en) | Field effect transistor | |
| JPS55130171A (en) | Mos field effect transistor | |
| JPS54156483A (en) | Non-volatile semiconductor memory device | |
| JPS54136275A (en) | Field effect transistor of isolation gate | |
| JPS5457969A (en) | Electric field effect transistor | |
| JPS55140270A (en) | Insulated gate transistor | |
| JPS5636170A (en) | Manufacture of field-effect semiconductor device | |
| JPS6461060A (en) | Semiconductor device | |
| JPS6461059A (en) | Semiconductor device | |
| JPS54129984A (en) | Manufacture of semiconductor device | |
| JPS5673468A (en) | Mos type semiconductor device | |
| JPS5642372A (en) | Manufacture of semiconductor device | |
| JPS5723272A (en) | Junction type field effect transistor | |
| JPS5546585A (en) | Complementary insulated gate field effect semiconductor device | |
| JPS54144182A (en) | Semiconductor device | |
| JPS57134976A (en) | Manufacture of field effect transistor | |
| JPS558078A (en) | Floating gate type mos field effect transistor | |
| JPS55141760A (en) | Field effect transistor | |
| JPS572578A (en) | Junction type field effect transistor |