JPS5546404A - Metal-halogen thin film cell - Google Patents

Metal-halogen thin film cell

Info

Publication number
JPS5546404A
JPS5546404A JP11913878A JP11913878A JPS5546404A JP S5546404 A JPS5546404 A JP S5546404A JP 11913878 A JP11913878 A JP 11913878A JP 11913878 A JP11913878 A JP 11913878A JP S5546404 A JPS5546404 A JP S5546404A
Authority
JP
Japan
Prior art keywords
active material
layer
cathode
anode
barrier layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11913878A
Other languages
Japanese (ja)
Inventor
Masayuki Fukuoka
Tatsumi Arakawa
Muneaki Kimura
Yukihisa Masukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP11913878A priority Critical patent/JPS5546404A/en
Publication of JPS5546404A publication Critical patent/JPS5546404A/en
Pending legal-status Critical Current

Links

Classifications

    • Y02E60/12

Landscapes

  • Conductive Materials (AREA)
  • Primary Cells (AREA)

Abstract

PURPOSE: To make the promotion of improvement for cell life, by providing a barrier layer, consisting of a specific organic compound, between active materials of cathode and anode of the cell that uses a metal cathode active material and halogen anode active material.
CONSTITUTION: The construction is made by a cathode layer, with a thin layer of metals, selected from silver, copper, tin, lead, aluminum, bismuth, tellrium, being the acrive material, and an anode layer of the active material including halogens like bromine, iodine, etc. Between these active material layers of cathode and anode, is provided a barrier layer including at least more than one kind of the organic compounds selected from among succinic acid imide, phthalic acid imide, cyanuric acid. And further to improve the cell life, between the cathode active material layer and the barrier layer, is constructed a metal halogen compound or oxide layer of the cathode active material by the methods of evaporation, and it is preferable to mix an aromatic N heterocyclic compound, for instance, pyridine quinoline to the barrier layer.
COPYRIGHT: (C)1980,JPO&Japio
JP11913878A 1978-09-29 1978-09-29 Metal-halogen thin film cell Pending JPS5546404A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11913878A JPS5546404A (en) 1978-09-29 1978-09-29 Metal-halogen thin film cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11913878A JPS5546404A (en) 1978-09-29 1978-09-29 Metal-halogen thin film cell

Publications (1)

Publication Number Publication Date
JPS5546404A true JPS5546404A (en) 1980-04-01

Family

ID=14753864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11913878A Pending JPS5546404A (en) 1978-09-29 1978-09-29 Metal-halogen thin film cell

Country Status (1)

Country Link
JP (1) JPS5546404A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02269719A (en) * 1989-03-03 1990-11-05 Internatl Business Mach Corp <Ibm> Photo-setting adhesive

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02269719A (en) * 1989-03-03 1990-11-05 Internatl Business Mach Corp <Ibm> Photo-setting adhesive

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