JPS5554332A - Modification of 4-methyl pentene polymer - Google Patents

Modification of 4-methyl pentene polymer

Info

Publication number
JPS5554332A
JPS5554332A JP12725978A JP12725978A JPS5554332A JP S5554332 A JPS5554332 A JP S5554332A JP 12725978 A JP12725978 A JP 12725978A JP 12725978 A JP12725978 A JP 12725978A JP S5554332 A JPS5554332 A JP S5554332A
Authority
JP
Japan
Prior art keywords
pentene polymer
methyl
modification
polymer
tpx
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12725978A
Other languages
Japanese (ja)
Other versions
JPS6030339B2 (en
Inventor
Katsumi Tanaka
Katsumi Funakoshi
Yoshio Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Petrochemical Industries Ltd
Original Assignee
Mitsui Petrochemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Petrochemical Industries Ltd filed Critical Mitsui Petrochemical Industries Ltd
Priority to JP53127259A priority Critical patent/JPS6030339B2/en
Publication of JPS5554332A publication Critical patent/JPS5554332A/en
Publication of JPS6030339B2 publication Critical patent/JPS6030339B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Processes Of Treating Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Abstract

PURPOSE: To obtain a resin havig improved transparency, nesistance to stress-cracking and chemicals and heat, by irradiating 4-methyl-1-pentene polymer.
CONSTITUTION: 4-Methyl-1-pentene polymer (TPX), preferably its final molded article, is exposed to high-energy irradiation, preferably γ-rays of several to 10M rad, in a vacuum or the atmosphere of an inert gas. preferably, a homo-or copolymer with a 5W18C 1-olefin or a copolymer prepared by grafting a vinyl monomer onto the polymer may be used as TPX.
COPYRIGHT: (C)1980,JPO&Japio
JP53127259A 1978-10-18 1978-10-18 Method for modifying 4↓-methyl↓-1↓-pentene polymer Expired JPS6030339B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53127259A JPS6030339B2 (en) 1978-10-18 1978-10-18 Method for modifying 4↓-methyl↓-1↓-pentene polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53127259A JPS6030339B2 (en) 1978-10-18 1978-10-18 Method for modifying 4↓-methyl↓-1↓-pentene polymer

Publications (2)

Publication Number Publication Date
JPS5554332A true JPS5554332A (en) 1980-04-21
JPS6030339B2 JPS6030339B2 (en) 1985-07-16

Family

ID=14955609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53127259A Expired JPS6030339B2 (en) 1978-10-18 1978-10-18 Method for modifying 4↓-methyl↓-1↓-pentene polymer

Country Status (1)

Country Link
JP (1) JPS6030339B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013108814A1 (en) * 2012-01-17 2013-07-25 大日本印刷株式会社 Electron beam curable resin composition, resin frame for reflectors, reflector, semiconductor light emitting device, and method for producing molded body
JP2015023101A (en) * 2013-07-17 2015-02-02 大日本印刷株式会社 SEMICONDUCTOR LIGHT EMITTING DEVICE, SEMICONDUCTOR LIGHT EMITTING DEVICE COMPONENT AND METHOD FOR PRODUCING THE SAME, AND REFLECTOR, MANUFACTURING METHOD THEREOF AND REFLECTOR FORMING COMPOSITION
JP2015023099A (en) * 2013-07-17 2015-02-02 大日本印刷株式会社 Semiconductor light emitting device manufacturing method, molded body manufacturing method, electron beam curable resin composition, reflector resin frame, and reflector
JP2015023100A (en) * 2013-07-17 2015-02-02 大日本印刷株式会社 Method for manufacturing semiconductor light emitting device, method for manufacturing component for semiconductor light emitting device, method for manufacturing reflector, and composition for forming reflector

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7448437B2 (en) 2020-08-06 2024-03-12 株式会社ミツトヨ Control method for shape measuring device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013108814A1 (en) * 2012-01-17 2013-07-25 大日本印刷株式会社 Electron beam curable resin composition, resin frame for reflectors, reflector, semiconductor light emitting device, and method for producing molded body
US9975284B2 (en) 2012-01-17 2018-05-22 Dai Nipon Printing Co., Ltd. Electron beam curable resin composition, resin frame for reflectors, reflector, semiconductor light emitting device, and method for producing molded body
JP2015023101A (en) * 2013-07-17 2015-02-02 大日本印刷株式会社 SEMICONDUCTOR LIGHT EMITTING DEVICE, SEMICONDUCTOR LIGHT EMITTING DEVICE COMPONENT AND METHOD FOR PRODUCING THE SAME, AND REFLECTOR, MANUFACTURING METHOD THEREOF AND REFLECTOR FORMING COMPOSITION
JP2015023099A (en) * 2013-07-17 2015-02-02 大日本印刷株式会社 Semiconductor light emitting device manufacturing method, molded body manufacturing method, electron beam curable resin composition, reflector resin frame, and reflector
JP2015023100A (en) * 2013-07-17 2015-02-02 大日本印刷株式会社 Method for manufacturing semiconductor light emitting device, method for manufacturing component for semiconductor light emitting device, method for manufacturing reflector, and composition for forming reflector

Also Published As

Publication number Publication date
JPS6030339B2 (en) 1985-07-16

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