JPS5557841A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5557841A
JPS5557841A JP12989178A JP12989178A JPS5557841A JP S5557841 A JPS5557841 A JP S5557841A JP 12989178 A JP12989178 A JP 12989178A JP 12989178 A JP12989178 A JP 12989178A JP S5557841 A JPS5557841 A JP S5557841A
Authority
JP
Japan
Prior art keywords
cresol
photosensitive composition
aldehyde
phenol
quinonediazide compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12989178A
Other languages
Japanese (ja)
Other versions
JPS5654621B2 (en
Inventor
Masatoshi Matsuzaki
Fumio Shimada
Sei Goto
Akio Iwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP12989178A priority Critical patent/JPS5557841A/en
Publication of JPS5557841A publication Critical patent/JPS5557841A/en
Publication of JPS5654621B2 publication Critical patent/JPS5654621B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE: To obtain proper alkaline solubility, excellent chemical and printing resistance, and good afinity for ink, by containing co-condensation polymer resin of phenol and cresol and aldehyde in a photosensitive composition containing o- quinonediazide compound.
CONSTITUTION: A photosensitive composition containing o-quinonediazide compound to be used in photolithographic printing or the like is mixed with co-condensation substance of phenol and cresol and aldehyde. Cresol may be either single or mixture of o-m-p, but m-p-mixture is preferably. The mixing ratio of phenol to cresol may be 1:9W9:1 by mol ratio. The weight average molecular weight of the co-condensation substance should be 700W6000. Aldehyde may be aliphatic or aromatic aldehyde, and formaldehyde or acetaldehyde should be preferable. The co-condensation substance should be compounded by 40W80wt% of the total solid matter of the photosensitive composition, and o-quinonediazide compound by 10W50wt%.
COPYRIGHT: (C)1980,JPO&Japio
JP12989178A 1978-10-20 1978-10-20 Photosensitive composition Granted JPS5557841A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12989178A JPS5557841A (en) 1978-10-20 1978-10-20 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12989178A JPS5557841A (en) 1978-10-20 1978-10-20 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5557841A true JPS5557841A (en) 1980-04-30
JPS5654621B2 JPS5654621B2 (en) 1981-12-26

Family

ID=15020902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12989178A Granted JPS5557841A (en) 1978-10-20 1978-10-20 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS5557841A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140235A (en) * 1983-12-07 1985-07-25 オリン　マイクロエレクトロニック　ケミカルズ　インコーポレーテッド Positive acting photoresist composition
JPS60176034A (en) * 1984-02-23 1985-09-10 Japan Synthetic Rubber Co Ltd Positive photosensitive resin composition
JPS61107352A (en) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd Positive plating material for lithographic printing
JPS6273255A (en) * 1985-09-26 1987-04-03 Konishiroku Photo Ind Co Ltd photosensitive composition
JPS62133461A (en) * 1985-12-04 1987-06-16 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate material
EP0441638A2 (en) 1990-02-08 1991-08-14 Konica Corporation Light sensitive litho printing plate
EP0660186A1 (en) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Photosensitive resin composition and method for forming a pattern using the composition
WO1998042877A1 (en) * 1997-03-20 1998-10-01 Bayer Aktiengesellschaft Novel phenol condensation products
US7112397B2 (en) 2003-01-07 2006-09-26 Okamoto Chemical Industry Co., Ltd. Image forming composition and photosensitive lithographic plate using same
EP2065211A1 (en) 2007-11-30 2009-06-03 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP2098376A1 (en) 2008-03-04 2009-09-09 Agfa Graphics N.V. A method for making a lithographic printing plate support
EP2106924A1 (en) 2008-03-31 2009-10-07 Agfa Graphics N.V. A method for treating a lithographic printing plate
US8419923B2 (en) 2006-08-03 2013-04-16 Agfa Graphics Nv Lithographic printing plate support
EP3032334A1 (en) 2014-12-08 2016-06-15 Agfa Graphics Nv A system for reducing ablation debris
WO2017157578A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50125806A (en) * 1974-03-25 1975-10-03
JPS5271224A (en) * 1975-12-11 1977-06-14 Toshiba Corp Positive type light sensitive composition
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50125806A (en) * 1974-03-25 1975-10-03
JPS5271224A (en) * 1975-12-11 1977-06-14 Toshiba Corp Positive type light sensitive composition
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140235A (en) * 1983-12-07 1985-07-25 オリン　マイクロエレクトロニック　ケミカルズ　インコーポレーテッド Positive acting photoresist composition
JPS60176034A (en) * 1984-02-23 1985-09-10 Japan Synthetic Rubber Co Ltd Positive photosensitive resin composition
JPS61107352A (en) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd Positive plating material for lithographic printing
JPS6273255A (en) * 1985-09-26 1987-04-03 Konishiroku Photo Ind Co Ltd photosensitive composition
JPS62133461A (en) * 1985-12-04 1987-06-16 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate material
EP0441638A2 (en) 1990-02-08 1991-08-14 Konica Corporation Light sensitive litho printing plate
EP0660186A1 (en) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Photosensitive resin composition and method for forming a pattern using the composition
WO1998042877A1 (en) * 1997-03-20 1998-10-01 Bayer Aktiengesellschaft Novel phenol condensation products
US7112397B2 (en) 2003-01-07 2006-09-26 Okamoto Chemical Industry Co., Ltd. Image forming composition and photosensitive lithographic plate using same
US8419923B2 (en) 2006-08-03 2013-04-16 Agfa Graphics Nv Lithographic printing plate support
EP2065211A1 (en) 2007-11-30 2009-06-03 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP2098376A1 (en) 2008-03-04 2009-09-09 Agfa Graphics N.V. A method for making a lithographic printing plate support
EP2106924A1 (en) 2008-03-31 2009-10-07 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP3032334A1 (en) 2014-12-08 2016-06-15 Agfa Graphics Nv A system for reducing ablation debris
WO2017157578A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
WO2017157575A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method and apparatus for processing a lithographic printing plate
WO2017157579A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
WO2017157576A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
WO2017157572A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Apparatus for processing a lithographic printing plate and corresponding method
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Also Published As

Publication number Publication date
JPS5654621B2 (en) 1981-12-26

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