JPS5563824A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS5563824A
JPS5563824A JP13749678A JP13749678A JPS5563824A JP S5563824 A JPS5563824 A JP S5563824A JP 13749678 A JP13749678 A JP 13749678A JP 13749678 A JP13749678 A JP 13749678A JP S5563824 A JPS5563824 A JP S5563824A
Authority
JP
Japan
Prior art keywords
lamp
exposure device
light source
heat
distortions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13749678A
Other languages
Japanese (ja)
Inventor
Kazutaka Ikeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP13749678A priority Critical patent/JPS5563824A/en
Publication of JPS5563824A publication Critical patent/JPS5563824A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent the temperature rise in a lamp, prevent cracks due to distortions, and lengthen its life by mounting a heat radiating body in the vicinity of the light source of light exposure device. CONSTITUTION:Heat discharger 10 is provided at a position removed from the plane mirror of light exposure device, which is placed in the neighborhood of light source lamp 2 provided in lamp housing unit 1. The heat accumulated in lamp 2 is absorbed and discharged by heat discharger 10. By this, the temperature rise in light source lamp 2 is minimized, and blowing up due to small cracks and distortions is prevented and the life of lamp 2 is lengthened.
JP13749678A 1978-11-08 1978-11-08 Exposure device Pending JPS5563824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13749678A JPS5563824A (en) 1978-11-08 1978-11-08 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13749678A JPS5563824A (en) 1978-11-08 1978-11-08 Exposure device

Publications (1)

Publication Number Publication Date
JPS5563824A true JPS5563824A (en) 1980-05-14

Family

ID=15200009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13749678A Pending JPS5563824A (en) 1978-11-08 1978-11-08 Exposure device

Country Status (1)

Country Link
JP (1) JPS5563824A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197033U (en) * 1981-06-09 1982-12-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197033U (en) * 1981-06-09 1982-12-14

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Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20040824

A045 Written measure of dismissal of application

Effective date: 20041221

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