JPS556401A - Far infrared ray radiator - Google Patents

Far infrared ray radiator

Info

Publication number
JPS556401A
JPS556401A JP7522978A JP7522978A JPS556401A JP S556401 A JPS556401 A JP S556401A JP 7522978 A JP7522978 A JP 7522978A JP 7522978 A JP7522978 A JP 7522978A JP S556401 A JPS556401 A JP S556401A
Authority
JP
Japan
Prior art keywords
spinel structure
al2o3
coo
infrared ray
far infrared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7522978A
Other languages
Japanese (ja)
Other versions
JPS5934233B2 (en
Inventor
Akio Mitomo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Global Life Solutions Inc
Original Assignee
Hitachi Heating Appliances Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Heating Appliances Co Ltd filed Critical Hitachi Heating Appliances Co Ltd
Priority to JP53075229A priority Critical patent/JPS5934233B2/en
Publication of JPS556401A publication Critical patent/JPS556401A/en
Publication of JPS5934233B2 publication Critical patent/JPS5934233B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

PURPOSE:To improve the radiation characteristic, the thermal characteristic, the life, the strength and the design, by lining the radiation surface with the blue substance constituted of the spinel structure of alumina and cobalt oxide, by means of the metalization method. CONSTITUTION:The mixed powder of Al2O3 and CoO is calcined at 1000-1400 deg.C causing the solid phase reaction between Al2O3 and CoO. In the resulted solid solution, each atom of Al, Co, O, is constructed into a ceramic spinel structure which is thermostable and is excellent in the emissivity for 4-50mu. The oxide of Al, Co including the spinel structure by at least 3 or more wt% is lined on the surface of the heat radiator by means of the metallization method. This heat radiator is suitable for the baking of the paint, the heating and heat retaining for the foods, the room heating, etc.
JP53075229A 1978-06-21 1978-06-21 far infrared radiation device Expired JPS5934233B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53075229A JPS5934233B2 (en) 1978-06-21 1978-06-21 far infrared radiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53075229A JPS5934233B2 (en) 1978-06-21 1978-06-21 far infrared radiation device

Publications (2)

Publication Number Publication Date
JPS556401A true JPS556401A (en) 1980-01-17
JPS5934233B2 JPS5934233B2 (en) 1984-08-21

Family

ID=13570179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53075229A Expired JPS5934233B2 (en) 1978-06-21 1978-06-21 far infrared radiation device

Country Status (1)

Country Link
JP (1) JPS5934233B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054159A (en) * 1983-07-30 1985-03-28 ソ−ン イ−エムアイ ピ−エルシ− Incandescent lamp
JPS6089520U (en) * 1983-11-25 1985-06-19 大阪瓦斯株式会社 heating device
JPS60125418U (en) * 1984-02-01 1985-08-23 大阪瓦斯株式会社 combustion appliances
JP2005179779A (en) * 2003-12-17 2005-07-07 Sulzer Metco (Us) Inc Flow apparatus with ceramic abradable
CN115745571A (en) * 2022-10-27 2023-03-07 南京工业大学 Material type selective radiator and preparation method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054159A (en) * 1983-07-30 1985-03-28 ソ−ン イ−エムアイ ピ−エルシ− Incandescent lamp
JPS6089520U (en) * 1983-11-25 1985-06-19 大阪瓦斯株式会社 heating device
JPS60125418U (en) * 1984-02-01 1985-08-23 大阪瓦斯株式会社 combustion appliances
JP2005179779A (en) * 2003-12-17 2005-07-07 Sulzer Metco (Us) Inc Flow apparatus with ceramic abradable
CN115745571A (en) * 2022-10-27 2023-03-07 南京工业大学 Material type selective radiator and preparation method thereof

Also Published As

Publication number Publication date
JPS5934233B2 (en) 1984-08-21

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