JPS5565436A - Plasma treatment device - Google Patents

Plasma treatment device

Info

Publication number
JPS5565436A
JPS5565436A JP13961278A JP13961278A JPS5565436A JP S5565436 A JPS5565436 A JP S5565436A JP 13961278 A JP13961278 A JP 13961278A JP 13961278 A JP13961278 A JP 13961278A JP S5565436 A JPS5565436 A JP S5565436A
Authority
JP
Japan
Prior art keywords
stocks
rotation
vessel
gear
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13961278A
Other languages
Japanese (ja)
Inventor
Takeshi Sakashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13961278A priority Critical patent/JPS5565436A/en
Publication of JPS5565436A publication Critical patent/JPS5565436A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To reduce uneven treatment by making the substrate stocks with the substance to be treated to make revolution as well as rotation in a vacuum vessel wherein plasma is generating.
CONSTITUTION: An exhaust port 19 and a gas leading-in 11 is provided in the vessel wall of a vacuum vessel consisting of quarz glass. The opening part is sealed by an upper cap 12 through an O ring. In the center of the bottom a boss 9a is provided, said part is penetrated by an axis of rotation 14, which is made to rotate sealing through a driving source, of which upper end is provided a fixed arm 19. Further both ends of said fixed arm 19 are provided with a respective boss 19a, and here the stocks 20 having a gear 21 respectively are fitted. Next, facing said gear 21 inside the vessel wall an internal gear 18 is provided, which interlocks therewith. When the axis of rotation 14 is made to rotate, the stocks 20 are made to generate revolution and rotation. With said constitution, the substrate to be treated is placed on the stocks 20 and high frequency current is supplied from an oscillator 23 to a metallic electrode to generate plasma inside the vessel 9.
COPYRIGHT: (C)1980,JPO&Japio
JP13961278A 1978-11-10 1978-11-10 Plasma treatment device Pending JPS5565436A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13961278A JPS5565436A (en) 1978-11-10 1978-11-10 Plasma treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13961278A JPS5565436A (en) 1978-11-10 1978-11-10 Plasma treatment device

Publications (1)

Publication Number Publication Date
JPS5565436A true JPS5565436A (en) 1980-05-16

Family

ID=15249335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13961278A Pending JPS5565436A (en) 1978-11-10 1978-11-10 Plasma treatment device

Country Status (1)

Country Link
JP (1) JPS5565436A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4595570A (en) * 1983-02-25 1986-06-17 Toyota Jidosha Kabushiki Kaisha Apparatus and method for plasma treatment of resin material
JPS6276629A (en) * 1985-09-30 1987-04-08 Toshiba Corp Sheet type plasma etching method
US4842828A (en) * 1987-02-18 1989-06-27 Hitachi, Ltd. Apparatus for treating surface of object with ultraviolet rays and reaction gas

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4595570A (en) * 1983-02-25 1986-06-17 Toyota Jidosha Kabushiki Kaisha Apparatus and method for plasma treatment of resin material
AU578499B2 (en) * 1983-02-25 1988-10-27 Toyota Jidosha Kabushiki Kaisha Apparatus and method for plasma treatment of resin material
US4874453A (en) * 1983-02-25 1989-10-17 Toyota Jidosha Kabushiki Kaisha Apparatus and method for plasma treatment of resin material
JPS6276629A (en) * 1985-09-30 1987-04-08 Toshiba Corp Sheet type plasma etching method
US4842828A (en) * 1987-02-18 1989-06-27 Hitachi, Ltd. Apparatus for treating surface of object with ultraviolet rays and reaction gas

Similar Documents

Publication Publication Date Title
JPS55134175A (en) Microwave plasma etching unit
JPS5565436A (en) Plasma treatment device
JPS5564414A (en) Container for crystal vibrator
JPS57134559A (en) Physical vapor deposition device
JPS55101853A (en) Method of fabricating comparison electrode with fet
JPS5612197A (en) Diaphragm for loudspeaker
JPS57131372A (en) Plasma etching device
JPS53141182A (en) Plasma chemical vapor depositing device
JPS56166377A (en) Plasma treating method of hollow body
JPS5757871A (en) Vapor depositing device
JPS5564345A (en) Manufacturing equipment of discharging lamp
JPS5644763A (en) Cvd device under reduced pressure
JPS55110777A (en) Plasma treating apparatus
JPS5612193A (en) Diaphragm for loudspeaker
JPS5615533A (en) Manufacture of electron tube
JPS6489520A (en) Dry etching
JPS57211239A (en) Formation of insulating film
JPS53147698A (en) Method of producing anataze-rutile layer-like composite material
JPS5595254A (en) Manufacturing method of high-pressure metal vapor discharge lamp
JPS54162966A (en) Vapor growth method and its device for semiconductor substrate
JPS57118415A (en) Vacuum sealing method of quartz oscillator
KR890002014B1 (en) The method of surface treatment for vacuum picking blood tube
JPS5676524A (en) Device for rotatably holding substrate
JPS5497375A (en) Cylindrical plasma processor
JPS52120585A (en) Metallic vapor discharge lamp