JPS557472A - Forming method for thermal recording head - Google Patents
Forming method for thermal recording headInfo
- Publication number
- JPS557472A JPS557472A JP8173978A JP8173978A JPS557472A JP S557472 A JPS557472 A JP S557472A JP 8173978 A JP8173978 A JP 8173978A JP 8173978 A JP8173978 A JP 8173978A JP S557472 A JPS557472 A JP S557472A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film resistor
- recording head
- forming method
- thermal recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Electronic Switches (AREA)
Abstract
PURPOSE:To provide a head of good printing quality and high printing speed by adding a re-forming step for forming a smooth flat portion in the central portion of a wear-resistant layer. CONSTITUTION:The central portion 42 of a wear-resistant layer 4, i.e. that portion of the layer 4 which corresponds to the peak portion of the film resistor 3 is flattened. This flattening is carried out by grinding that portion of the layer 4 which touches the heat-sensitive recording paper by means of a lapping tape after electrode conductors 2, film resistor 3, and the layer 4 are formed. Thus, a smooth flat portion 45 with a predetermined area can be formed irrespective of the shape of the film resistor 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8173978A JPS557472A (en) | 1978-07-04 | 1978-07-04 | Forming method for thermal recording head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8173978A JPS557472A (en) | 1978-07-04 | 1978-07-04 | Forming method for thermal recording head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS557472A true JPS557472A (en) | 1980-01-19 |
Family
ID=13754795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8173978A Pending JPS557472A (en) | 1978-07-04 | 1978-07-04 | Forming method for thermal recording head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS557472A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01209160A (en) * | 1988-02-18 | 1989-08-22 | Matsushita Electric Ind Co Ltd | thermal head |
| JPH05222150A (en) * | 1991-11-07 | 1993-08-31 | Bayer Ag | Water-dispersible polyisocyanate mixture, process for producing same, and method of using it in two-component water-based coating material |
| US7166673B2 (en) | 2000-10-20 | 2007-01-23 | Dainippon Ink And Chemicals, Inc. | Water-dispersible polyisocyanate composition, process for its production, water-base curable composition and its application |
| DE112008000778T5 (en) | 2007-03-23 | 2010-04-08 | Mitsubishi Paper Mills Limited | Water-developable photosensitive lithographic printing plate material |
-
1978
- 1978-07-04 JP JP8173978A patent/JPS557472A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01209160A (en) * | 1988-02-18 | 1989-08-22 | Matsushita Electric Ind Co Ltd | thermal head |
| JPH05222150A (en) * | 1991-11-07 | 1993-08-31 | Bayer Ag | Water-dispersible polyisocyanate mixture, process for producing same, and method of using it in two-component water-based coating material |
| US7166673B2 (en) | 2000-10-20 | 2007-01-23 | Dainippon Ink And Chemicals, Inc. | Water-dispersible polyisocyanate composition, process for its production, water-base curable composition and its application |
| US7417090B2 (en) | 2000-10-20 | 2008-08-26 | Dainippon Ink & Chemicals, Inc. | Water-dispersible polyisocyanate composition, production thereof, and water-based curable composition and application thereof |
| DE112008000778T5 (en) | 2007-03-23 | 2010-04-08 | Mitsubishi Paper Mills Limited | Water-developable photosensitive lithographic printing plate material |
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