JPS5575222A - Electro-optical mirror tube - Google Patents
Electro-optical mirror tubeInfo
- Publication number
- JPS5575222A JPS5575222A JP14889978A JP14889978A JPS5575222A JP S5575222 A JPS5575222 A JP S5575222A JP 14889978 A JP14889978 A JP 14889978A JP 14889978 A JP14889978 A JP 14889978A JP S5575222 A JPS5575222 A JP S5575222A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- aperture
- image
- astigmatism
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a high-resolution electron beam by providing an astigmatism- correcting coil for an aperture image in the vicinity of an objective lens, and another astigmatism-correcting coil at the location well apart from a crossover image and between an electron gun and an objective lens.
CONSTITUTION: A crossover image is generated at a point A by an electron beam from an electron gun 1. An aperture image, which is obtained by projecting a Gaussian-distribution electron beam to an aperture 2, is projected to an aperture 5 through a condenser lens 3 and a projection lens 4. Then, after said image has been reduced by a reducing lens 6, it is projected on a specimen 8 by an objective lens 7, thereby an electro-optical mirror tube is constituted. In this constitution, an astigmatism-correction coil 10 is provided between the lens 4 and the aperture 5, and an astigmatism-correction coil 9 is provided directly over the lens 7, thereby the minimum disturbed circle on the main surface of the lens 7 can be reduced and stable high resolution can be obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53148899A JPS5842936B2 (en) | 1978-12-01 | 1978-12-01 | Electron optical lens barrel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53148899A JPS5842936B2 (en) | 1978-12-01 | 1978-12-01 | Electron optical lens barrel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5575222A true JPS5575222A (en) | 1980-06-06 |
| JPS5842936B2 JPS5842936B2 (en) | 1983-09-22 |
Family
ID=15463161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53148899A Expired JPS5842936B2 (en) | 1978-12-01 | 1978-12-01 | Electron optical lens barrel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5842936B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62229937A (en) * | 1986-03-31 | 1987-10-08 | Toshiba Corp | Electron beam lithography equipment |
| JPH0877957A (en) * | 1994-09-06 | 1996-03-22 | Hitachi Ltd | Charged particle projection device |
-
1978
- 1978-12-01 JP JP53148899A patent/JPS5842936B2/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62229937A (en) * | 1986-03-31 | 1987-10-08 | Toshiba Corp | Electron beam lithography equipment |
| JPH0877957A (en) * | 1994-09-06 | 1996-03-22 | Hitachi Ltd | Charged particle projection device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5842936B2 (en) | 1983-09-22 |
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