JPS5575272A - Solar battery - Google Patents
Solar batteryInfo
- Publication number
- JPS5575272A JPS5575272A JP14940078A JP14940078A JPS5575272A JP S5575272 A JPS5575272 A JP S5575272A JP 14940078 A JP14940078 A JP 14940078A JP 14940078 A JP14940078 A JP 14940078A JP S5575272 A JPS5575272 A JP S5575272A
- Authority
- JP
- Japan
- Prior art keywords
- gaas
- growing
- substrate
- silicon substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
Landscapes
- Photovoltaic Devices (AREA)
Abstract
PURPOSE: To greatly reduce the cost of a solar battery, by epitaxially growing a III∼ V groups compound semiconductor layer on a silicon substrate.
CONSTITUTION: A p+-GaAs layer 10', a p-GaAs layer 2' an n+-GaAs layer 3' and an n+-AlxGa1-xAs layer 4' are sequentially produced by epitaxial growing on a p+-silicon substrate 11. Molecular-beam epitaxial growing is one of methods for expitaxially growing GaAs crystal on the silicon substrate. In the molecular-beam epitaxial growing, the temperature of the substrate can be set at about 400°C, which is much lower than that (700∼800°C) of the substrate for epitaxially growing GaAs at liquid or gas phase. For this reason, single crystal of GaAs can be epitaxially grown on the silicon substrate. This results in greatly reducing the cost in comparison with epitaxial growth of such single crystal on a GaAs substrate.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53149400A JPS5951755B2 (en) | 1978-11-30 | 1978-11-30 | How to manufacture solar cells |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53149400A JPS5951755B2 (en) | 1978-11-30 | 1978-11-30 | How to manufacture solar cells |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5575272A true JPS5575272A (en) | 1980-06-06 |
| JPS5951755B2 JPS5951755B2 (en) | 1984-12-15 |
Family
ID=15474296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53149400A Expired JPS5951755B2 (en) | 1978-11-30 | 1978-11-30 | How to manufacture solar cells |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5951755B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62500410A (en) * | 1984-04-27 | 1987-02-19 | アドバンストエナジ−フアンド リミテツド パ−トナ−シツプ | epitaxial composite |
-
1978
- 1978-11-30 JP JP53149400A patent/JPS5951755B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62500410A (en) * | 1984-04-27 | 1987-02-19 | アドバンストエナジ−フアンド リミテツド パ−トナ−シツプ | epitaxial composite |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5951755B2 (en) | 1984-12-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5696834A (en) | Compound semiconductor epitaxial wafer and manufacture thereof | |
| EP0179138A4 (en) | A METHOD FOR PRODUCING A CONNECTION SEMICONDUCTOR STRUCTURE. | |
| GB1176691A (en) | High Resistivity Compounds and Alloys and Methods of Making Same. | |
| JPS56138917A (en) | Vapor phase epitaxial growth | |
| JPS52152164A (en) | Epitaxial wafer of group iii-v compound | |
| JPS5577131A (en) | Vapor phase growth of compound semiconductor epitaxial film | |
| JPS6437832A (en) | Method of growing compound semiconductor crystal | |
| JPS54106169A (en) | Vapor epitaxial growth device | |
| JPS5618000A (en) | Vapor phase growing method for 3-5 group compound semiconductor | |
| JPS5317067A (en) | Vapor phase epitaxial growth method | |
| LI | Studies of growth-in defects and transport properties versus growth parameters in III-V compound semiconductors[Annual Technical Report, 11 Jun. 1981- 10 Jun. 1982] | |
| JPS5323561A (en) | Vapor phase growth met hod of compound semiconductor | |
| JPS55158200A (en) | Vapor phase growing method for p-type gaas single crystal layer | |
| JPS56105625A (en) | Manufacture of compound semiconductor thin film single crystal of high ratio resistance and low transition density | |
| JPS5432182A (en) | Epitaxial growing method in liquid phase | |
| JPS5649519A (en) | Vapor growth of compound semiconductor | |
| JPS57199275A (en) | Infrared rays detecting element | |
| JPS5453977A (en) | Manufacture for gallium phosphide green light emitting element | |
| JPS5271172A (en) | Growth of p type boron phosphide semiconductor | |
| JPS5489567A (en) | Gas phase growth method for compound semiconductor crystal | |
| JPS5529180A (en) | Production of gallium arsenide compound semiconductor element | |
| JPH01179795A (en) | Vapor growth method for iii-v compound semiconductor | |
| JPS5379384A (en) | Forming method of polycrystalline gaas thin film and stabilizing method ofsemiconductor of semiconductor | |
| JPS5673696A (en) | Vapor phase growing method | |
| JPS57123897A (en) | Forming method of compound semiconductor crystal |