JPS5576346A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS5576346A JPS5576346A JP15079478A JP15079478A JPS5576346A JP S5576346 A JPS5576346 A JP S5576346A JP 15079478 A JP15079478 A JP 15079478A JP 15079478 A JP15079478 A JP 15079478A JP S5576346 A JPS5576346 A JP S5576346A
- Authority
- JP
- Japan
- Prior art keywords
- diazide
- compound
- guinone
- component
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 phenyl compound Chemical class 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 abstract 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 abstract 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 abstract 1
- MPGOFFXRGUQRMW-UHFFFAOYSA-N [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O Chemical group [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O MPGOFFXRGUQRMW-UHFFFAOYSA-N 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000012643 polycondensation polymerization Methods 0.000 abstract 1
- 229940079877 pyrogallol Drugs 0.000 abstract 1
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
Abstract
PURPOSE: To obtain the positive type photosensitive composition which has moderate solubility to alkali solutions and with which ground stains and image damages at the developing are difficult to occur by condensating the specific polyhydroxy phenyl compound and o-guinone diazide compound.
CONSTITUTION: The polyhydroxy phenyl compound (preferably molecular weights about 305W5,000) obtained through co-condensation polymerization of resorsinols (derivatives) such as resorcinol, cresolcinol and orcinol pyrogallol and acetone (A) and the o-guinone diazide having haloquenosulfonyl groups such as o-benzoquinone diazide (B) are dissolved in dioxane and are then caused to react for about 2W4 hours at about 40W50°C (the extent at which about 1/5 or more of the phenolic hydroxyl groups of the component A are condensated with the diazide compound of the component B is preferable), whereby the photosensitive resin is obtained. The above-mentioned resin may be used alone but the use as the composition mixed with alkali soluble resins is desirable.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15079478A JPS5576346A (en) | 1978-12-05 | 1978-12-05 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15079478A JPS5576346A (en) | 1978-12-05 | 1978-12-05 | Photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5576346A true JPS5576346A (en) | 1980-06-09 |
| JPS6244257B2 JPS6244257B2 (en) | 1987-09-18 |
Family
ID=15504570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15079478A Granted JPS5576346A (en) | 1978-12-05 | 1978-12-05 | Photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5576346A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61107352A (en) * | 1984-10-31 | 1986-05-26 | Konishiroku Photo Ind Co Ltd | Positive plating material for lithographic printing |
| JPS62134649A (en) * | 1985-12-09 | 1987-06-17 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic printing plate material |
| EP2065211A1 (en) | 2007-11-30 | 2009-06-03 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP2098376A1 (en) | 2008-03-04 | 2009-09-09 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| EP2106924A1 (en) | 2008-03-31 | 2009-10-07 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| US8419923B2 (en) | 2006-08-03 | 2013-04-16 | Agfa Graphics Nv | Lithographic printing plate support |
| EP3032334A1 (en) | 2014-12-08 | 2016-06-15 | Agfa Graphics Nv | A system for reducing ablation debris |
| WO2017157576A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1314552B1 (en) | 1998-04-06 | 2009-08-05 | FUJIFILM Corporation | Photosensitive resin composition |
-
1978
- 1978-12-05 JP JP15079478A patent/JPS5576346A/en active Granted
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61107352A (en) * | 1984-10-31 | 1986-05-26 | Konishiroku Photo Ind Co Ltd | Positive plating material for lithographic printing |
| JPS62134649A (en) * | 1985-12-09 | 1987-06-17 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic printing plate material |
| US8419923B2 (en) | 2006-08-03 | 2013-04-16 | Agfa Graphics Nv | Lithographic printing plate support |
| EP2065211A1 (en) | 2007-11-30 | 2009-06-03 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP2098376A1 (en) | 2008-03-04 | 2009-09-09 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| EP2106924A1 (en) | 2008-03-31 | 2009-10-07 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP3032334A1 (en) | 2014-12-08 | 2016-06-15 | Agfa Graphics Nv | A system for reducing ablation debris |
| WO2017157576A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| WO2017157579A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| WO2017157575A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method and apparatus for processing a lithographic printing plate |
| WO2017157571A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method and apparatus for processing a lithographic printing plate |
| WO2017157578A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| WO2017157572A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Apparatus for processing a lithographic printing plate and corresponding method |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| WO2020074258A1 (en) | 2018-10-08 | 2020-04-16 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6244257B2 (en) | 1987-09-18 |
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