JPS5577143A - Soft x-ray exposure apparatus - Google Patents

Soft x-ray exposure apparatus

Info

Publication number
JPS5577143A
JPS5577143A JP15089378A JP15089378A JPS5577143A JP S5577143 A JPS5577143 A JP S5577143A JP 15089378 A JP15089378 A JP 15089378A JP 15089378 A JP15089378 A JP 15089378A JP S5577143 A JPS5577143 A JP S5577143A
Authority
JP
Japan
Prior art keywords
substrate
skewness
soft
directions
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15089378A
Other languages
Japanese (ja)
Other versions
JPH0125221B2 (en
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP15089378A priority Critical patent/JPS5577143A/en
Publication of JPS5577143A publication Critical patent/JPS5577143A/en
Publication of JPH0125221B2 publication Critical patent/JPH0125221B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To eliminate geometrical skewness of the pattern by moving the substrate by 90° in two directions within the target, when the substrate is exposed on the surface by means of a transmissible soft X-ray source with electron beam irradiating from the back of the metal foil target.
CONSTITUTION: A substrate 52 coated with a mask and a resist is initially moved in a transmitting surface source 51 comprising a metal foil target step by step in an alternate manner according to the order of ΔX→Δy→ΔX→Δy. Then, when it reaches the position C as illustrated, the direction of Δy is reversed and the same procedure is repeated, while the substrate 52 is continuously treated to eliminate the skewness Δ. It is most important that the substrate never move simultaneously in the directions x and y. Such movement will cause the substrate 52 to move in one diagonal direction thus making impossible the elimination of the skewness Δ in all direction. Also, necessary is it that the substrate 52 should be smaller in the area than that of the surface source 51.
COPYRIGHT: (C)1980,JPO&Japio
JP15089378A 1978-12-05 1978-12-05 Soft x-ray exposure apparatus Granted JPS5577143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15089378A JPS5577143A (en) 1978-12-05 1978-12-05 Soft x-ray exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15089378A JPS5577143A (en) 1978-12-05 1978-12-05 Soft x-ray exposure apparatus

Publications (2)

Publication Number Publication Date
JPS5577143A true JPS5577143A (en) 1980-06-10
JPH0125221B2 JPH0125221B2 (en) 1989-05-16

Family

ID=15506673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15089378A Granted JPS5577143A (en) 1978-12-05 1978-12-05 Soft x-ray exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5577143A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003034476A1 (en) * 2001-10-16 2003-04-24 Waseda University Pattern drawing method, mask, and mask manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003034476A1 (en) * 2001-10-16 2003-04-24 Waseda University Pattern drawing method, mask, and mask manufacturing method
JP2003124099A (en) * 2001-10-16 2003-04-25 Univ Waseda Pattern drawing method, mask and mask manufacturing method

Also Published As

Publication number Publication date
JPH0125221B2 (en) 1989-05-16

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