JPS55784A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS55784A JPS55784A JP6313779A JP6313779A JPS55784A JP S55784 A JPS55784 A JP S55784A JP 6313779 A JP6313779 A JP 6313779A JP 6313779 A JP6313779 A JP 6313779A JP S55784 A JPS55784 A JP S55784A
- Authority
- JP
- Japan
- Prior art keywords
- monomer
- photosensitizer
- formula
- bearing
- photopolymerizable unsaturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title 1
- 239000000178 monomer Substances 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000004952 Polyamide Substances 0.000 abstract 2
- 239000003112 inhibitor Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 229920002647 polyamide Polymers 0.000 abstract 2
- QYXHDJJYVDLECA-UHFFFAOYSA-N 2,5-diphenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=C(C=2C=CC=CC=2)C(=O)C=C1C1=CC=CC=C1 QYXHDJJYVDLECA-UHFFFAOYSA-N 0.000 abstract 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 abstract 1
- 229940076442 9,10-anthraquinone Drugs 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 238000012719 thermal polymerization Methods 0.000 abstract 1
Landscapes
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Abstract
PURPOSE: Title composition that is composed of a specific polyamide, a monomer with photopolymerizable unsaturated bond, a photosensitizer and a thermal polymerzation inhibitor, thus reproducing images with sharp outline and giving high mechanical strength.
CONSTITUTION: To a mixture of 100wt% of a polyamide (A) from the starting material containing 10W100 mole% of a monomer bearing a basic nitrogen of formula I (R1, R2 are 1W10C hydrocarbyl where they may incorporate to form ring or heterocycle; R3 is 1W3C lower alkyl, formula II; Yis -aminopropyl) and 5W150wt% of monomer (B) bearing 2 or more photopolymerizable unsaturated double bonds, as acrylic acid, methacrylic acid, or glycidyl methacrylate, are added (C) 0.01W5wt%, based on (A) + (B), of a photosensitizer as 9,10-anthraquinone, benzophenone, and (D) 0.001W2wt% of a thermal polymerization inhibitor as hydroquinone or 2,5-diphenyl-p-benzoquinone.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6313779A JPS55784A (en) | 1979-05-21 | 1979-05-21 | Photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6313779A JPS55784A (en) | 1979-05-21 | 1979-05-21 | Photosensitive resin composition |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5916773A Division JPS532082B2 (en) | 1973-05-26 | 1973-05-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55784A true JPS55784A (en) | 1980-01-07 |
| JPS575401B2 JPS575401B2 (en) | 1982-01-30 |
Family
ID=13220573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6313779A Granted JPS55784A (en) | 1979-05-21 | 1979-05-21 | Photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55784A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59147346A (en) * | 1983-02-10 | 1984-08-23 | Nippon Soda Co Ltd | Acid-developable polybutadiene type photosensitive resin |
| JPH01182845A (en) * | 1988-01-13 | 1989-07-20 | Toyobo Co Ltd | Photosensitive resin composition |
-
1979
- 1979-05-21 JP JP6313779A patent/JPS55784A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59147346A (en) * | 1983-02-10 | 1984-08-23 | Nippon Soda Co Ltd | Acid-developable polybutadiene type photosensitive resin |
| JPH01182845A (en) * | 1988-01-13 | 1989-07-20 | Toyobo Co Ltd | Photosensitive resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS575401B2 (en) | 1982-01-30 |
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