JPS5580253A - Charged particle beam processing device - Google Patents

Charged particle beam processing device

Info

Publication number
JPS5580253A
JPS5580253A JP15353178A JP15353178A JPS5580253A JP S5580253 A JPS5580253 A JP S5580253A JP 15353178 A JP15353178 A JP 15353178A JP 15353178 A JP15353178 A JP 15353178A JP S5580253 A JPS5580253 A JP S5580253A
Authority
JP
Japan
Prior art keywords
beams
ion
processing device
charged particle
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15353178A
Other languages
Japanese (ja)
Inventor
Kiyoshi Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15353178A priority Critical patent/JPS5580253A/en
Publication of JPS5580253A publication Critical patent/JPS5580253A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE: To reduce the size and facilitate the provision and positioning of sensors and analysers by making the beams emitted from a magnetic field parallel to each other and aligning the directional focusing points of respective beams in a line.
CONSTITUTION: A neutral corpuscle beam 7 is ionized by an ionizing device 5 and converted into an ion beam 2, which enters into magnetic pole plates 1 through plane of incidence 1A. The ion beam is deflected between the magnetic pole plates 1 and emitted from the plane of emission 1B at respective angles in proportion to the mass. The deflected ion beams 21W25 are collected by energy sensors 61W65 disposed at respective directional focusing points so that the ion beams are separated according to the mass.
COPYRIGHT: (C)1980,JPO&Japio
JP15353178A 1978-12-12 1978-12-12 Charged particle beam processing device Pending JPS5580253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15353178A JPS5580253A (en) 1978-12-12 1978-12-12 Charged particle beam processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15353178A JPS5580253A (en) 1978-12-12 1978-12-12 Charged particle beam processing device

Publications (1)

Publication Number Publication Date
JPS5580253A true JPS5580253A (en) 1980-06-17

Family

ID=15564551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15353178A Pending JPS5580253A (en) 1978-12-12 1978-12-12 Charged particle beam processing device

Country Status (1)

Country Link
JP (1) JPS5580253A (en)

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