JPS5581347A - Alignment mechanism - Google Patents

Alignment mechanism

Info

Publication number
JPS5581347A
JPS5581347A JP15505778A JP15505778A JPS5581347A JP S5581347 A JPS5581347 A JP S5581347A JP 15505778 A JP15505778 A JP 15505778A JP 15505778 A JP15505778 A JP 15505778A JP S5581347 A JPS5581347 A JP S5581347A
Authority
JP
Japan
Prior art keywords
alignment
pattern
diffracted light
masks
measured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15505778A
Other languages
Japanese (ja)
Other versions
JPS6042891B2 (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP53155057A priority Critical patent/JPS6042891B2/en
Publication of JPS5581347A publication Critical patent/JPS5581347A/en
Publication of JPS6042891B2 publication Critical patent/JPS6042891B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To facilitate alignment of photo mask and wafer, by using alignment pattern composed of parallel fringes.
CONSTITUTION: Alignment patterns 3, 7 consisting of non-transmitting parts 9 and transmitting parts 10 arranged parallel by an arbitrary number of pieces at specified width (a) and specified pitch (b) are provided on masks 2, 6 to be measured. The coherent light beam from a light source 1 enters the alignment pattern 3, and the generated primary diffracted light pattern enters the alignment pattern 7 through reflecting mirrors 4, 5, and the generated secondary diffracted light pattern and primary diffracted light pattern enter a photo detector 8. When a rotation deviation is caused in both diffracted light patterns, an output is delivered from the photo detector 8, so that the rotation deviation of both masks 2, 6 being measured may be easily detected.
COPYRIGHT: (C)1980,JPO&Japio
JP53155057A 1978-12-14 1978-12-14 alignment mechanism Expired JPS6042891B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53155057A JPS6042891B2 (en) 1978-12-14 1978-12-14 alignment mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53155057A JPS6042891B2 (en) 1978-12-14 1978-12-14 alignment mechanism

Publications (2)

Publication Number Publication Date
JPS5581347A true JPS5581347A (en) 1980-06-19
JPS6042891B2 JPS6042891B2 (en) 1985-09-25

Family

ID=15597720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53155057A Expired JPS6042891B2 (en) 1978-12-14 1978-12-14 alignment mechanism

Country Status (1)

Country Link
JP (1) JPS6042891B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104128A (en) * 1982-12-06 1984-06-15 Nippon Telegr & Teleph Corp <Ntt> Method and device for positioning by double diffraction gratings

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104128A (en) * 1982-12-06 1984-06-15 Nippon Telegr & Teleph Corp <Ntt> Method and device for positioning by double diffraction gratings

Also Published As

Publication number Publication date
JPS6042891B2 (en) 1985-09-25

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