JPS559060B2 - - Google Patents
Info
- Publication number
- JPS559060B2 JPS559060B2 JP9997274A JP9997274A JPS559060B2 JP S559060 B2 JPS559060 B2 JP S559060B2 JP 9997274 A JP9997274 A JP 9997274A JP 9997274 A JP9997274 A JP 9997274A JP S559060 B2 JPS559060 B2 JP S559060B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9997274A JPS5127833A (ja) | 1974-09-02 | 1974-09-02 | Chitaniumunoshokukokuhoho |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9997274A JPS5127833A (ja) | 1974-09-02 | 1974-09-02 | Chitaniumunoshokukokuhoho |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5127833A JPS5127833A (ja) | 1976-03-09 |
| JPS559060B2 true JPS559060B2 (ja) | 1980-03-07 |
Family
ID=14261567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9997274A Granted JPS5127833A (ja) | 1974-09-02 | 1974-09-02 | Chitaniumunoshokukokuhoho |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5127833A (ja) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5414166A (en) * | 1977-07-05 | 1979-02-02 | Oki Electric Ind Co Ltd | Manufacture for semiconductor device |
| US4203800A (en) * | 1977-12-30 | 1980-05-20 | International Business Machines Corporation | Reactive ion etching process for metals |
| JPS5494196A (en) * | 1977-12-30 | 1979-07-25 | Ibm | Metallic layer removing method |
| US4226666A (en) * | 1978-08-21 | 1980-10-07 | International Business Machines Corporation | Etching method employing radiation and noble gas halide |
| US4330384A (en) * | 1978-10-27 | 1982-05-18 | Hitachi, Ltd. | Process for plasma etching |
| US4213818A (en) * | 1979-01-04 | 1980-07-22 | Signetics Corporation | Selective plasma vapor etching process |
| JPS6022695A (ja) * | 1983-07-19 | 1985-02-05 | 原子燃料工業株式会社 | 原子炉炉心の出力状態の監視法 |
| JPH0823073B2 (ja) * | 1986-11-26 | 1996-03-06 | 東京応化工業株式会社 | ドライエッチング方法 |
| US7078337B2 (en) * | 2003-09-30 | 2006-07-18 | Agere Systems Inc. | Selective isotropic etch for titanium-based materials |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3795557A (en) * | 1972-05-12 | 1974-03-05 | Lfe Corp | Process and material for manufacturing semiconductor devices |
| JPS576691B2 (ja) * | 1972-06-17 | 1982-02-06 | ||
| JPS5441870B2 (ja) * | 1972-11-22 | 1979-12-11 |
-
1974
- 1974-09-02 JP JP9997274A patent/JPS5127833A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5127833A (ja) | 1976-03-09 |