JPS5593527A - Production of magnetoresistance effect type magnetic head - Google Patents

Production of magnetoresistance effect type magnetic head

Info

Publication number
JPS5593527A
JPS5593527A JP16428978A JP16428978A JPS5593527A JP S5593527 A JPS5593527 A JP S5593527A JP 16428978 A JP16428978 A JP 16428978A JP 16428978 A JP16428978 A JP 16428978A JP S5593527 A JPS5593527 A JP S5593527A
Authority
JP
Japan
Prior art keywords
layer
thin layer
magnetoresistance effect
resistor
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16428978A
Other languages
Japanese (ja)
Other versions
JPS6032883B2 (en
Inventor
Hisatoshi Kuzumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP16428978A priority Critical patent/JPS6032883B2/en
Publication of JPS5593527A publication Critical patent/JPS5593527A/en
Publication of JPS6032883B2 publication Critical patent/JPS6032883B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)

Abstract

PURPOSE: To obtain a high-stability and high-reliability head by providing the first thin layer having a magnetoresistance effect on a substrate and providing the second thin layer, which can be etched selectively, on the first thin layer and providing a photo resistor layer on the second thin layer and performing a post-processing.
CONSTITUTION: Layer 2a having a magnetoresistance effect (MR effect) such as Permalloy is formed on substrate 1 such as silicon by evaporation, etc., and next, Al thin layer 5 is formed, and next, photo resistor layer 6 is provided. Next, mask alignment, exposure to light and development are performed, and exposed Al layer 5 and Permalloy layer 2a are removed by etching. Next, resistor layer 6 is removed to obtain a MR element. Thus, since no resistor is caused to adhere onto the MR element, a head of a low resistance value of 7W9Ω and of a uniform and stable characteristic can be obtained by utilizing a photo resistor to connect Cr, Au, etc., of signal leading-out conductors and the MR element after evaporation or sputtering of Cr, Au, etc. Then, the contact part is not burned even if a large current is flowed to the MR element, so that the output can be large.
COPYRIGHT: (C)1980,JPO&Japio
JP16428978A 1978-12-29 1978-12-29 Manufacturing method of magnetoresistive magnetic head Expired JPS6032883B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16428978A JPS6032883B2 (en) 1978-12-29 1978-12-29 Manufacturing method of magnetoresistive magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16428978A JPS6032883B2 (en) 1978-12-29 1978-12-29 Manufacturing method of magnetoresistive magnetic head

Publications (2)

Publication Number Publication Date
JPS5593527A true JPS5593527A (en) 1980-07-16
JPS6032883B2 JPS6032883B2 (en) 1985-07-31

Family

ID=15790268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16428978A Expired JPS6032883B2 (en) 1978-12-29 1978-12-29 Manufacturing method of magnetoresistive magnetic head

Country Status (1)

Country Link
JP (1) JPS6032883B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63285719A (en) * 1987-05-15 1988-11-22 Fujitsu Ltd Magneto-resistance effect type magnetic head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63285719A (en) * 1987-05-15 1988-11-22 Fujitsu Ltd Magneto-resistance effect type magnetic head

Also Published As

Publication number Publication date
JPS6032883B2 (en) 1985-07-31

Similar Documents

Publication Publication Date Title
JPH0130408B2 (en)
JPS57204111A (en) Forming method for magnetic thin-film pattern
JPS5593527A (en) Production of magnetoresistance effect type magnetic head
US3649392A (en) Thin-film circuit formation
JPS56137519A (en) Thin film magnetic head
JPS57164413A (en) Manufacture of thin film magnetic head
JPS5534449A (en) Thin film magnetoresistance element with bias magnetic field minute adjusting mechanism
KR940004365B1 (en) Manufacturing method of magnetoresistive element
JPS5492527A (en) Manufacture of metal foil having apertures
JPS5750483A (en) Thin film reluctance effective element
JPS641215A (en) Manufacture of magnetic thin film
US3919055A (en) Bubble domain detector contact
JPS5495132A (en) Production of magnetic bubble memory unit
JPS54111285A (en) Production of semiconductor device
JPS5721883A (en) Magnetic reluctance effect element
JPS5577076A (en) Manufacture of magnetic bubble element
JPS55113124A (en) Thin-film magnetic resistance head
JPS58201351A (en) Preparation of tantalum thin film integrated circuit
JPS5877228A (en) Photoetching method
JPS5750459A (en) Manufacture of hybrid integrated circuit
JPS5484986A (en) Production of infrared-rays detector element
JPS5587322A (en) Manufacture of thin film magnetic head
KR880701400A (en) Manufacturing method of integrated circuit device
JPS585448B2 (en) Magnetic head manufacturing method
JPS5518019A (en) Method of fabricating bubble memory chip