JPS5594473A - Ion plating apparatus for multi-component coating - Google Patents

Ion plating apparatus for multi-component coating

Info

Publication number
JPS5594473A
JPS5594473A JP192679A JP192679A JPS5594473A JP S5594473 A JPS5594473 A JP S5594473A JP 192679 A JP192679 A JP 192679A JP 192679 A JP192679 A JP 192679A JP S5594473 A JPS5594473 A JP S5594473A
Authority
JP
Japan
Prior art keywords
substrate
electrode
composing
component coating
component ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP192679A
Other languages
Japanese (ja)
Inventor
Akikimi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP192679A priority Critical patent/JPS5594473A/en
Publication of JPS5594473A publication Critical patent/JPS5594473A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To make the control of component ratio easy and to form the multi-component coating, by providing one or two or more of sputtering electrode near the substrate and composing so as to be co-deposited the substrate composing the above electrode with the substance from evaporation source on the surface of the substrate at the same time. CONSTITUTION:Apparatus is constructed by arranging the evaporation source 2 and the substrate 5 facing each other in the vacuum room 1 provided gas exhausting system (not shown in the figure) and gas introducing system and newly providing the sputtering electrode 6 near the substrate 5 with an usual construction arranged the thermal cathode 3 and the anode 4 is order to form discharge plasma. It is constructed so as to be applied a hogh negative voltage on the electrode 6 in the room 1. By the above apparatus, the substance from the source 2 and that of composing the electrode 6, are co-deposited on the substrate 5 and also, the component ratio is able to control easily. Multi-component coating having disired component ratio, is able to form easily with a cheap apparatus compared with usual method.
JP192679A 1979-01-11 1979-01-11 Ion plating apparatus for multi-component coating Pending JPS5594473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP192679A JPS5594473A (en) 1979-01-11 1979-01-11 Ion plating apparatus for multi-component coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP192679A JPS5594473A (en) 1979-01-11 1979-01-11 Ion plating apparatus for multi-component coating

Publications (1)

Publication Number Publication Date
JPS5594473A true JPS5594473A (en) 1980-07-17

Family

ID=11515195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP192679A Pending JPS5594473A (en) 1979-01-11 1979-01-11 Ion plating apparatus for multi-component coating

Country Status (1)

Country Link
JP (1) JPS5594473A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6083365A (en) * 1997-10-21 2000-07-04 Sanyo Vacuum Industries Co. Ltd. Method for forming a thin film and apparatus for the same
US8691064B2 (en) * 2007-07-09 2014-04-08 Raytheon Canada Limited Sputter-enhanced evaporative deposition apparatus and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6083365A (en) * 1997-10-21 2000-07-04 Sanyo Vacuum Industries Co. Ltd. Method for forming a thin film and apparatus for the same
US6090457A (en) * 1997-10-21 2000-07-18 Sanyo Vaccum Industries Co. Ltd. Process of making a thin film
US8691064B2 (en) * 2007-07-09 2014-04-08 Raytheon Canada Limited Sputter-enhanced evaporative deposition apparatus and method

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