JPS559539A - Heat resistant paste for photoforming - Google Patents
Heat resistant paste for photoformingInfo
- Publication number
- JPS559539A JPS559539A JP8212178A JP8212178A JPS559539A JP S559539 A JPS559539 A JP S559539A JP 8212178 A JP8212178 A JP 8212178A JP 8212178 A JP8212178 A JP 8212178A JP S559539 A JPS559539 A JP S559539A
- Authority
- JP
- Japan
- Prior art keywords
- heat resistant
- pts
- photoforming
- photoresist
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 abstract 4
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 239000004952 Polyamide Substances 0.000 abstract 2
- 239000004962 Polyamide-imide Substances 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 229920002647 polyamide Polymers 0.000 abstract 2
- 229920002312 polyamide-imide Polymers 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 239000004642 Polyimide Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 229940114081 cinnamate Drugs 0.000 abstract 1
- 150000001247 metal acetylides Chemical class 0.000 abstract 1
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000002798 polar solvent Substances 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 abstract 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical group [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
Landscapes
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To prepare a paste capable of photoforming and superior in electric characteristics and heat resistance, by using a specified heat resistant photoresist as a binder.
CONSTITUTION: One hundred wt. pts of heat resistant photoresist consisting of a sensitizer and a heat resistant photoresist selected from polyimide type, polyamideimide type, or polyamide acid type photoresist, for example, cinnamate group- introduced organic solvent-soluble polyamideimide or polyamide acid are dissolved in a proper polar solvent, preferably in an amount of 140 to 2000 wt. pts.. Into this solution are dispersed particles selected from metals, metal oxides, metal nitrides, metal carbides, carbon, and boron for imparting electric characteristics, preferably in an amount of 50 to 1000 wt. pts..
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8212178A JPS559539A (en) | 1978-07-07 | 1978-07-07 | Heat resistant paste for photoforming |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8212178A JPS559539A (en) | 1978-07-07 | 1978-07-07 | Heat resistant paste for photoforming |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS559539A true JPS559539A (en) | 1980-01-23 |
Family
ID=13765572
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8212178A Pending JPS559539A (en) | 1978-07-07 | 1978-07-07 | Heat resistant paste for photoforming |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559539A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5913616U (en) * | 1982-07-15 | 1984-01-27 | 三菱重工業株式会社 | Internal combustion engine supply and exhaust valves |
| JPS59160139A (en) * | 1983-03-04 | 1984-09-10 | Hitachi Ltd | Photosensitive polymer composition |
| JPS60255821A (en) * | 1984-05-17 | 1985-12-17 | チバ‐ガイギー アーゲー | Polymer, coated workpiece thereby, relief image and manufacture of protective layer |
| JPS6195551A (en) * | 1984-10-16 | 1986-05-14 | Matsushita Electric Ind Co Ltd | Multiwiring structure of integrated circuit |
| JPS6313032A (en) * | 1986-07-03 | 1988-01-20 | Ube Ind Ltd | Organic solvent soluble positive type photosensitive polyimide composition |
| JPH05134402A (en) * | 1991-02-26 | 1993-05-28 | Hitachi Ltd | Resist mask for dry etching and it's resist mask resin composition and fine working method by dry etching using the resist mask |
| JPH10319580A (en) * | 1994-11-17 | 1998-12-04 | Toray Ind Inc | Method for producing photosensitive conductive paste and electrode |
| JPH1152572A (en) * | 1997-08-08 | 1999-02-26 | Fujitsu Ltd | Photosensitive resin composition and pattern forming method using the same |
| JPH11327135A (en) * | 1998-05-20 | 1999-11-26 | Fujitsu Ltd | Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using the composition, and patterned heat-resistant insulating film obtained by the method |
| JP2018521191A (en) * | 2015-07-22 | 2018-08-02 | サン ケミカル コーポレイション | Printed circuit board ink |
-
1978
- 1978-07-07 JP JP8212178A patent/JPS559539A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5913616U (en) * | 1982-07-15 | 1984-01-27 | 三菱重工業株式会社 | Internal combustion engine supply and exhaust valves |
| JPS59160139A (en) * | 1983-03-04 | 1984-09-10 | Hitachi Ltd | Photosensitive polymer composition |
| JPS60255821A (en) * | 1984-05-17 | 1985-12-17 | チバ‐ガイギー アーゲー | Polymer, coated workpiece thereby, relief image and manufacture of protective layer |
| JPS6195551A (en) * | 1984-10-16 | 1986-05-14 | Matsushita Electric Ind Co Ltd | Multiwiring structure of integrated circuit |
| JPS6313032A (en) * | 1986-07-03 | 1988-01-20 | Ube Ind Ltd | Organic solvent soluble positive type photosensitive polyimide composition |
| JPH05134402A (en) * | 1991-02-26 | 1993-05-28 | Hitachi Ltd | Resist mask for dry etching and it's resist mask resin composition and fine working method by dry etching using the resist mask |
| JPH10319580A (en) * | 1994-11-17 | 1998-12-04 | Toray Ind Inc | Method for producing photosensitive conductive paste and electrode |
| JPH1152572A (en) * | 1997-08-08 | 1999-02-26 | Fujitsu Ltd | Photosensitive resin composition and pattern forming method using the same |
| JPH11327135A (en) * | 1998-05-20 | 1999-11-26 | Fujitsu Ltd | Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using the composition, and patterned heat-resistant insulating film obtained by the method |
| JP2018521191A (en) * | 2015-07-22 | 2018-08-02 | サン ケミカル コーポレイション | Printed circuit board ink |
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