JPS5596532A - Manufacturing method of shadow mask - Google Patents
Manufacturing method of shadow maskInfo
- Publication number
- JPS5596532A JPS5596532A JP292679A JP292679A JPS5596532A JP S5596532 A JPS5596532 A JP S5596532A JP 292679 A JP292679 A JP 292679A JP 292679 A JP292679 A JP 292679A JP S5596532 A JPS5596532 A JP S5596532A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- rust prevention
- alkaline solution
- alkaline
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract 4
- 230000002265 prevention Effects 0.000 abstract 4
- 239000012670 alkaline solution Substances 0.000 abstract 3
- 238000000137 annealing Methods 0.000 abstract 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 abstract 3
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 abstract 2
- 230000003472 neutralizing effect Effects 0.000 abstract 2
- 150000007524 organic acids Chemical class 0.000 abstract 2
- 125000006850 spacer group Chemical group 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 abstract 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 abstract 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 abstract 1
- 238000003287 bathing Methods 0.000 abstract 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 abstract 1
- 239000013522 chelant Substances 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000001630 malic acid Substances 0.000 abstract 1
- 235000011090 malic acid Nutrition 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
PURPOSE:To perform good annealing even when requiring no spacer, by applying rust prevention on etched flat mask using alkaline solution then neutralizing the residual alkaline solution on the mask surface with organic acid. CONSTITUTION:Rusted flat mask having opening for passing many electron beam formed by etching is applied with rust prevention through alkaline bathing added with chelate agent. After mash water it is immersed in organic acid having high neutralizing ability such as 1-10vol.% of malic acid, citric acid, succinic acid, etc. to neutralize the residual alkaline solution on the surface of mask, then it is washed in water and applied with rust prevention using morpholine (trade name) or thin alkaline liquid of pH8-9. Since residual alkaline component on the mask is neutralized, cleaned and removed, good annealing where masks are not contacted tightly is achieved even when annealing requiring no spacer is applied as it is under same condition with mask not applied with rust prevention.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP292679A JPS5596532A (en) | 1979-01-17 | 1979-01-17 | Manufacturing method of shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP292679A JPS5596532A (en) | 1979-01-17 | 1979-01-17 | Manufacturing method of shadow mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5596532A true JPS5596532A (en) | 1980-07-22 |
| JPS6362856B2 JPS6362856B2 (en) | 1988-12-05 |
Family
ID=11542937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP292679A Granted JPS5596532A (en) | 1979-01-17 | 1979-01-17 | Manufacturing method of shadow mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5596532A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS553349U (en) * | 1979-03-13 | 1980-01-10 |
-
1979
- 1979-01-17 JP JP292679A patent/JPS5596532A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS553349U (en) * | 1979-03-13 | 1980-01-10 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6362856B2 (en) | 1988-12-05 |
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