JPS5599735A - Testing method for foreign material on wafer - Google Patents

Testing method for foreign material on wafer

Info

Publication number
JPS5599735A
JPS5599735A JP714579A JP714579A JPS5599735A JP S5599735 A JPS5599735 A JP S5599735A JP 714579 A JP714579 A JP 714579A JP 714579 A JP714579 A JP 714579A JP S5599735 A JPS5599735 A JP S5599735A
Authority
JP
Japan
Prior art keywords
polarized laser
polarized
laser
wafer
foreign material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP714579A
Other languages
Japanese (ja)
Other versions
JPS5948540B2 (en
Inventor
Nobuyuki Akiyama
Yoshisada Oshida
Yoshimasa Oshima
Mitsuyoshi Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP714579A priority Critical patent/JPS5948540B2/en
Publication of JPS5599735A publication Critical patent/JPS5599735A/en
Publication of JPS5948540B2 publication Critical patent/JPS5948540B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To detect P polarized laser contained in reflected light for recognizing foreign materials, by irradiating S polarized laser from slantly upside of the wafer.
CONSTITUTION: Because at the time of irradiation of X direction S polarized laser, S+P polarized laser is reflected from foreign material 3, it is converged by object lense 33 and from reflected light through translucent mirror 34, S polarized laser is cut by S polarized-laser-cut-filter 35 and thus P polarized laser component 27 is obtained and is detected by photoelectric converting element 37. On the other hand, with respect to Y direction, S polarized component which is obtained by cutting of P polarized laser is detected and, then, existence of foreign materials is recognized from the sum of the both detected values.
COPYRIGHT: (C)1980,JPO&Japio
JP714579A 1979-01-26 1979-01-26 Foreign matter inspection method on wafer Expired JPS5948540B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP714579A JPS5948540B2 (en) 1979-01-26 1979-01-26 Foreign matter inspection method on wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP714579A JPS5948540B2 (en) 1979-01-26 1979-01-26 Foreign matter inspection method on wafer

Publications (2)

Publication Number Publication Date
JPS5599735A true JPS5599735A (en) 1980-07-30
JPS5948540B2 JPS5948540B2 (en) 1984-11-27

Family

ID=11657894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP714579A Expired JPS5948540B2 (en) 1979-01-26 1979-01-26 Foreign matter inspection method on wafer

Country Status (1)

Country Link
JP (1) JPS5948540B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance
JPS62261044A (en) * 1986-05-06 1987-11-13 Hitachi Electronics Eng Co Ltd Foreign matter inspector
JPS63296348A (en) * 1987-05-28 1988-12-02 Hitachi Electronics Eng Co Ltd Detector of wafer foreign matter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance
JPS62261044A (en) * 1986-05-06 1987-11-13 Hitachi Electronics Eng Co Ltd Foreign matter inspector
JPS63296348A (en) * 1987-05-28 1988-12-02 Hitachi Electronics Eng Co Ltd Detector of wafer foreign matter

Also Published As

Publication number Publication date
JPS5948540B2 (en) 1984-11-27

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