JPS56100416A - Method and device for correcting mask - Google Patents

Method and device for correcting mask

Info

Publication number
JPS56100416A
JPS56100416A JP328180A JP328180A JPS56100416A JP S56100416 A JPS56100416 A JP S56100416A JP 328180 A JP328180 A JP 328180A JP 328180 A JP328180 A JP 328180A JP S56100416 A JPS56100416 A JP S56100416A
Authority
JP
Japan
Prior art keywords
mask
correction
camera
light
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP328180A
Other languages
Japanese (ja)
Other versions
JPS6217745B2 (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP328180A priority Critical patent/JPS56100416A/en
Publication of JPS56100416A publication Critical patent/JPS56100416A/en
Publication of JPS6217745B2 publication Critical patent/JPS6217745B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To automatically align the position of correction according to an electrical information and perform the correction in accordance with the kind of abnormality by inspecting a photomask electrically with a photoelectric conversion camera. CONSTITUTION:A white light 4 is applied vertically to a standard mask 1 and a mask to be inspected 2 through red and green filters 5 and 6 and is projected on a screen 12 and scanned by the photoelectric conversion camera 13. A part 14 where the masks 1 and 2 are overlapped, a light-transmitting part 15, the pinhole 16 of the mask and a remnant within the light-transmitting part are discriminated in color as black, yellow, green and red, respectively. Accordingly, difference is produced in conversion voltage levels of the camera 12. The mask is corrected automatically by controlling and driving a spot exposure system 18 operated by the voltage level and a burn-out system 13 by a laser. By this constitution, the number of processes of inspection and correction is reduced considerably and errors in correction are prevented, whereby the yield can be improved.
JP328180A 1980-01-16 1980-01-16 Method and device for correcting mask Granted JPS56100416A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP328180A JPS56100416A (en) 1980-01-16 1980-01-16 Method and device for correcting mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP328180A JPS56100416A (en) 1980-01-16 1980-01-16 Method and device for correcting mask

Publications (2)

Publication Number Publication Date
JPS56100416A true JPS56100416A (en) 1981-08-12
JPS6217745B2 JPS6217745B2 (en) 1987-04-20

Family

ID=11553027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP328180A Granted JPS56100416A (en) 1980-01-16 1980-01-16 Method and device for correcting mask

Country Status (1)

Country Link
JP (1) JPS56100416A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63228163A (en) * 1987-03-17 1988-09-22 Toppan Printing Co Ltd Plate inspection device
JP2002222751A (en) * 2001-01-25 2002-08-09 Nitto Kogaku Kk Aligner and assembling device
JP2008066452A (en) * 2006-09-06 2008-03-21 Renesas Technology Corp Manufacturing method of semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081685A (en) * 1973-11-21 1975-07-02
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081685A (en) * 1973-11-21 1975-07-02
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63228163A (en) * 1987-03-17 1988-09-22 Toppan Printing Co Ltd Plate inspection device
JP2002222751A (en) * 2001-01-25 2002-08-09 Nitto Kogaku Kk Aligner and assembling device
JP2008066452A (en) * 2006-09-06 2008-03-21 Renesas Technology Corp Manufacturing method of semiconductor device

Also Published As

Publication number Publication date
JPS6217745B2 (en) 1987-04-20

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