JPS56110940A - Method for developing and rinsing photoresist - Google Patents

Method for developing and rinsing photoresist

Info

Publication number
JPS56110940A
JPS56110940A JP806780A JP806780A JPS56110940A JP S56110940 A JPS56110940 A JP S56110940A JP 806780 A JP806780 A JP 806780A JP 806780 A JP806780 A JP 806780A JP S56110940 A JPS56110940 A JP S56110940A
Authority
JP
Japan
Prior art keywords
developing
gas
rinsing
processed
nozzles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP806780A
Other languages
Japanese (ja)
Inventor
Shigeji Kinoshita
Wataru Wakamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP806780A priority Critical patent/JPS56110940A/en
Publication of JPS56110940A publication Critical patent/JPS56110940A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To remove charge on sprayed particles and charge on the surface to be processed, by blowing ionized gas on the surface to be processed at the same time as developing and rinsing treatment. CONSTITUTION:Nozzle 5 for ionizing a gas is fixed in combination with each nozzle 3, 4 for developing and rinsing, and the ionized gas is blown on the surface to be processed simultaneously in spraying the developing and rinsing fluids from nozzles 3, 4. An inert filtered gas, such as air, N2, or Ar is used for said gas, and ionization is effected by discharge or the like due to application of a given voltage to the tips of nozzles 5.
JP806780A 1980-01-25 1980-01-25 Method for developing and rinsing photoresist Pending JPS56110940A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP806780A JPS56110940A (en) 1980-01-25 1980-01-25 Method for developing and rinsing photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP806780A JPS56110940A (en) 1980-01-25 1980-01-25 Method for developing and rinsing photoresist

Publications (1)

Publication Number Publication Date
JPS56110940A true JPS56110940A (en) 1981-09-02

Family

ID=11682995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP806780A Pending JPS56110940A (en) 1980-01-25 1980-01-25 Method for developing and rinsing photoresist

Country Status (1)

Country Link
JP (1) JPS56110940A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04211263A (en) * 1990-02-19 1992-08-03 Hitachi Chem Co Ltd Development method
JPH05173336A (en) * 1990-11-28 1993-07-13 Canon Inc Removing method and removing device for resist
US5700629A (en) * 1990-02-19 1997-12-23 Hitachi Chemical Company, Ltd. Developing process
KR100782939B1 (en) * 2001-12-29 2007-12-07 엘지.필립스 엘시디 주식회사 Cleaner and mask defect removal method of exposure mask
US7367725B2 (en) * 2004-04-22 2008-05-06 Innolux Display Corp. Method for removing developing solution
WO2020017376A1 (en) * 2018-07-18 2020-01-23 東京エレクトロン株式会社 Developing device and developing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945463B1 (en) * 1969-01-24 1974-12-04
JPS5016871B2 (en) * 1972-03-24 1975-06-17
JPS54113265A (en) * 1978-02-23 1979-09-04 Mitsubishi Electric Corp Resistor developing equipement

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945463B1 (en) * 1969-01-24 1974-12-04
JPS5016871B2 (en) * 1972-03-24 1975-06-17
JPS54113265A (en) * 1978-02-23 1979-09-04 Mitsubishi Electric Corp Resistor developing equipement

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04211263A (en) * 1990-02-19 1992-08-03 Hitachi Chem Co Ltd Development method
US5700629A (en) * 1990-02-19 1997-12-23 Hitachi Chemical Company, Ltd. Developing process
JPH05173336A (en) * 1990-11-28 1993-07-13 Canon Inc Removing method and removing device for resist
KR100782939B1 (en) * 2001-12-29 2007-12-07 엘지.필립스 엘시디 주식회사 Cleaner and mask defect removal method of exposure mask
US7367725B2 (en) * 2004-04-22 2008-05-06 Innolux Display Corp. Method for removing developing solution
WO2020017376A1 (en) * 2018-07-18 2020-01-23 東京エレクトロン株式会社 Developing device and developing method
CN112400215A (en) * 2018-07-18 2021-02-23 东京毅力科创株式会社 Developing apparatus and developing method
KR20210032419A (en) * 2018-07-18 2021-03-24 도쿄엘렉트론가부시키가이샤 Developing processing device and developing processing method
JPWO2020017376A1 (en) * 2018-07-18 2021-08-02 東京エレクトロン株式会社 Development processing equipment and development processing method
US11567444B2 (en) 2018-07-18 2023-01-31 Tokyo Electron Limited Developing treatment apparatus and developing treatment method
CN112400215B (en) * 2018-07-18 2024-03-26 东京毅力科创株式会社 Developing device and developing method

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