JPS56155802A - Recognition device - Google Patents

Recognition device

Info

Publication number
JPS56155802A
JPS56155802A JP5964280A JP5964280A JPS56155802A JP S56155802 A JPS56155802 A JP S56155802A JP 5964280 A JP5964280 A JP 5964280A JP 5964280 A JP5964280 A JP 5964280A JP S56155802 A JPS56155802 A JP S56155802A
Authority
JP
Japan
Prior art keywords
light source
light
image
detect
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5964280A
Other languages
Japanese (ja)
Inventor
Masahito Nakajima
Tetsuo Hizuka
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5964280A priority Critical patent/JPS56155802A/en
Publication of JPS56155802A publication Critical patent/JPS56155802A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Input (AREA)

Abstract

PURPOSE:To detect a light image at a high SN ratio by alternating a reflected light source and transmitted light source which illuminate a pattern on a ceramic substrate of hybrid IC. CONSTITUTION:To detect the light image of wiring pattern 4 on IC chip 3 of hybrid IC, illumination light source change-over circuit 19 opens shutter 12 and light from reflected light source 11 is projected on IC chip 3 through half-mirror 15. The reflected light image is detected by image pickup element 16 and binary-coded by preprocessing circuit 17, and pattern detecting circuit 18 detects its position. To detect the light image of wiring pattern 2 on a ceramic substrate, illumination light source change-over circuit 19 opens shutter 14 to irradiate substrate 1 with light from transmitted light source 13. Thus, the light images are detected at high SN ratios and detection are reduced.
JP5964280A 1980-05-06 1980-05-06 Recognition device Pending JPS56155802A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5964280A JPS56155802A (en) 1980-05-06 1980-05-06 Recognition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5964280A JPS56155802A (en) 1980-05-06 1980-05-06 Recognition device

Publications (1)

Publication Number Publication Date
JPS56155802A true JPS56155802A (en) 1981-12-02

Family

ID=13119070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5964280A Pending JPS56155802A (en) 1980-05-06 1980-05-06 Recognition device

Country Status (1)

Country Link
JP (1) JPS56155802A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59102106A (en) * 1982-12-03 1984-06-13 Hitachi Denshi Syst Service Kk Inspection method
JPS6055480A (en) * 1983-09-07 1985-03-30 Oki Electric Ind Co Ltd Pattern position recognizing method
JPS62138987A (en) * 1985-12-12 1987-06-22 Nec Corp Pattern recognizing method for through hole image
JPS63186376A (en) * 1987-01-28 1988-08-01 Ckd Corp Checking method for taped parts
JPH02187635A (en) * 1989-01-17 1990-07-23 Audio Technica Corp Color discriminating device
JPH04315036A (en) * 1991-04-12 1992-11-06 Mitsubishi Electric Corp Apparatus for inspecting transparent mold ic
JPH0587546A (en) * 1990-04-28 1993-04-06 Seiwa Sangyo Kk Method and device for inspecting appearance
US5225891A (en) * 1990-10-09 1993-07-06 Kabushiki Kaisha Toshiba Wire bonding external appearance inspecting apparatus
JPH08274136A (en) * 1995-03-31 1996-10-18 Ishikawa Pref Gov Hybrid IC inspection device
JP2009014744A (en) * 2008-10-20 2009-01-22 Toshiba Corp Pattern defect inspection system
US7522276B2 (en) 2003-03-31 2009-04-21 Kabushiki Kaisha Toshiba Pattern inspection method

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59102106A (en) * 1982-12-03 1984-06-13 Hitachi Denshi Syst Service Kk Inspection method
JPS6055480A (en) * 1983-09-07 1985-03-30 Oki Electric Ind Co Ltd Pattern position recognizing method
JPS62138987A (en) * 1985-12-12 1987-06-22 Nec Corp Pattern recognizing method for through hole image
JPS63186376A (en) * 1987-01-28 1988-08-01 Ckd Corp Checking method for taped parts
JPH02187635A (en) * 1989-01-17 1990-07-23 Audio Technica Corp Color discriminating device
JPH0587546A (en) * 1990-04-28 1993-04-06 Seiwa Sangyo Kk Method and device for inspecting appearance
US5225891A (en) * 1990-10-09 1993-07-06 Kabushiki Kaisha Toshiba Wire bonding external appearance inspecting apparatus
JPH04315036A (en) * 1991-04-12 1992-11-06 Mitsubishi Electric Corp Apparatus for inspecting transparent mold ic
JPH08274136A (en) * 1995-03-31 1996-10-18 Ishikawa Pref Gov Hybrid IC inspection device
US7522276B2 (en) 2003-03-31 2009-04-21 Kabushiki Kaisha Toshiba Pattern inspection method
JP2009014744A (en) * 2008-10-20 2009-01-22 Toshiba Corp Pattern defect inspection system

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