JPS5623936U - - Google Patents

Info

Publication number: JPS5623936U
Authority: JP; Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP1979105506U

Other versions

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1979-07-31

Filing date

1979-07-31

Publication date

1981-03-04

1979-07-31 Application filed filed Critical

1979-07-31 Priority to JP1979105506U priority Critical patent/JPS6022353Y2/ja

1981-03-04 Publication of JPS5623936U publication Critical patent/JPS5623936U/ja

1985-07-03 Application granted granted Critical

1985-07-03 Publication of JPS6022353Y2 publication Critical patent/JPS6022353Y2/ja

Status Expired legal-status Critical Current

Links

JP1979105506U 1979-07-31 1979-07-31 ホトマスク Expired JPS6022353Y2 (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP1979105506U JPS6022353Y2 (ja)	1979-07-31	1979-07-31	ホトマスク

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP1979105506U JPS6022353Y2 (ja)	1979-07-31	1979-07-31	ホトマスク

Publications (2)

Publication Number	Publication Date
JPS5623936U true JPS5623936U (ja)	1981-03-04
JPS6022353Y2 JPS6022353Y2 (ja)	1985-07-03

Family

ID=29338164

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP1979105506U Expired JPS6022353Y2 (ja)	1979-07-31	1979-07-31	ホトマスク

Country Status (1)

Country	Link
JP (1)	JPS6022353Y2 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2008111198A1 (ja) *	2007-03-14	2008-09-18	Fujitsu Microelectronics Limited	フォトマスク
JP2009122295A (ja) *	2007-11-14	2009-06-04	Dainippon Printing Co Ltd	フォトマスク
JP2009128558A (ja) *	2007-11-22	2009-06-11	Hoya Corp	フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

1979
- 1979-07-31 JP JP1979105506U patent/JPS6022353Y2/ja not_active Expired

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2008111198A1 (ja) *	2007-03-14	2008-09-18	Fujitsu Microelectronics Limited	フォトマスク
JP2009122295A (ja) *	2007-11-14	2009-06-04	Dainippon Printing Co Ltd	フォトマスク
JP2009128558A (ja) *	2007-11-22	2009-06-11	Hoya Corp	フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

Also Published As

Publication number	Publication date
JPS6022353Y2 (ja)	1985-07-03

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