JPS5626435A - Developing device - Google Patents

Developing device

Info

Publication number
JPS5626435A
JPS5626435A JP10221979A JP10221979A JPS5626435A JP S5626435 A JPS5626435 A JP S5626435A JP 10221979 A JP10221979 A JP 10221979A JP 10221979 A JP10221979 A JP 10221979A JP S5626435 A JPS5626435 A JP S5626435A
Authority
JP
Japan
Prior art keywords
bubbles
machined
highly accurate
developing liquid
accurate development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10221979A
Other languages
Japanese (ja)
Inventor
Kazunari Miyoshi
Osamu Kogure
Masami Kakuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP10221979A priority Critical patent/JPS5626435A/en
Publication of JPS5626435A publication Critical patent/JPS5626435A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To perform highly accurate development by yielding bubbles in developing liquid and enhancing agitating effect. CONSTITUTION:In the case bubbles are yielded in a developing tank, fresh developing liquid is always supplied on the surface of the material to be machined, unnecessary resist films can be removed by the dynamic action caused by the collision of the bubbles against the surfaces to be machined, thereby the highly accurate development can be accomplished.
JP10221979A 1979-08-13 1979-08-13 Developing device Pending JPS5626435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10221979A JPS5626435A (en) 1979-08-13 1979-08-13 Developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10221979A JPS5626435A (en) 1979-08-13 1979-08-13 Developing device

Publications (1)

Publication Number Publication Date
JPS5626435A true JPS5626435A (en) 1981-03-14

Family

ID=14321546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10221979A Pending JPS5626435A (en) 1979-08-13 1979-08-13 Developing device

Country Status (1)

Country Link
JP (1) JPS5626435A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58141532A (en) * 1982-02-17 1983-08-22 Toray Ind Inc Formation of polyimide pattern

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5069973A (en) * 1973-10-23 1975-06-11

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5069973A (en) * 1973-10-23 1975-06-11

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58141532A (en) * 1982-02-17 1983-08-22 Toray Ind Inc Formation of polyimide pattern

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