JPS5629238A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5629238A
JPS5629238A JP10385179A JP10385179A JPS5629238A JP S5629238 A JPS5629238 A JP S5629238A JP 10385179 A JP10385179 A JP 10385179A JP 10385179 A JP10385179 A JP 10385179A JP S5629238 A JPS5629238 A JP S5629238A
Authority
JP
Japan
Prior art keywords
image
photomask
plate
layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10385179A
Other languages
Japanese (ja)
Other versions
JPS6154211B2 (en
Inventor
Koji Ishida
Akira Okazaki
Tomihiro Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP10385179A priority Critical patent/JPS5629238A/en
Publication of JPS5629238A publication Critical patent/JPS5629238A/en
Publication of JPS6154211B2 publication Critical patent/JPS6154211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To eliminate an effect of fine dust on a photomask, by rendering thickness of a thin glass plate and an adhesive layer not smaller than twice the focus depth of a light condenser. CONSTITUTION:Nonhardened transparent adhesives 3A is coated on photomask 6 having mask pattern 2 on transparent substrate 1, and transparent thin glass plate 4 is stuck to layer 3A with high flatness in a dustfree box to form a uniform film of layer 3A. At that time, the distance between the surface of pattern 2 and that of plate 4 is adjusted in 20-300mum. This lower limit is >= twice the focus depth of a light condenser in order to prevent an image of dust, when attached to plate 4 or an image of a small scratch, if any, from forming a projection pattern on a wafer surface by rendering the image vague due to light diffraction. The upper limit of said distance is required to provide light transmittance for practical use, thus permitting an influence of fine dust to be eliminated.
JP10385179A 1979-08-15 1979-08-15 Photomask Granted JPS5629238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10385179A JPS5629238A (en) 1979-08-15 1979-08-15 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10385179A JPS5629238A (en) 1979-08-15 1979-08-15 Photomask

Publications (2)

Publication Number Publication Date
JPS5629238A true JPS5629238A (en) 1981-03-24
JPS6154211B2 JPS6154211B2 (en) 1986-11-21

Family

ID=14364936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10385179A Granted JPS5629238A (en) 1979-08-15 1979-08-15 Photomask

Country Status (1)

Country Link
JP (1) JPS5629238A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6257260U (en) * 1985-09-26 1987-04-09
JPS62288842A (en) * 1986-06-09 1987-12-15 Tosoh Corp Protective dustproof body for photomask reticle
US6933082B2 (en) 2001-11-08 2005-08-23 Dai Nippon Printing Co., Ltd. Photomask with dust-proofing device and exposure method using the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
JPS55121443A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS55121442A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
JPS55121443A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS55121442A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6257260U (en) * 1985-09-26 1987-04-09
JPS62288842A (en) * 1986-06-09 1987-12-15 Tosoh Corp Protective dustproof body for photomask reticle
US6933082B2 (en) 2001-11-08 2005-08-23 Dai Nippon Printing Co., Ltd. Photomask with dust-proofing device and exposure method using the same

Also Published As

Publication number Publication date
JPS6154211B2 (en) 1986-11-21

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