JPS5635765A - Ion plating apparatus for microparts - Google Patents

Ion plating apparatus for microparts

Info

Publication number
JPS5635765A
JPS5635765A JP11156079A JP11156079A JPS5635765A JP S5635765 A JPS5635765 A JP S5635765A JP 11156079 A JP11156079 A JP 11156079A JP 11156079 A JP11156079 A JP 11156079A JP S5635765 A JPS5635765 A JP S5635765A
Authority
JP
Japan
Prior art keywords
basket
microparts
ion plating
plating apparatus
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11156079A
Other languages
Japanese (ja)
Inventor
Kazumi Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP11156079A priority Critical patent/JPS5635765A/en
Publication of JPS5635765A publication Critical patent/JPS5635765A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To uniformly ion-plate microparts by putting them into a metal basket and installing a means of swinging the basket. CONSTITUTION:Microparts 4 such as wrist watch parts are put into metal basket 3 attached to metal fittings 2 on the top of shaft 1, and in order to apply minus charge, basket 3 is connected to rotating magnet 8 through sliding portion 5, insulating joint 6 and field through collar 7. Magnet 8 is rotated to vertically move both ends of basket 3 around shaft 1 to such a degree that microparts 4 in basket 3 are rolled. Such an apparatus is provided to an ion plating apparatus. Thus, many microparts 4 be plated uniformly with simple structure.
JP11156079A 1979-08-31 1979-08-31 Ion plating apparatus for microparts Pending JPS5635765A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11156079A JPS5635765A (en) 1979-08-31 1979-08-31 Ion plating apparatus for microparts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11156079A JPS5635765A (en) 1979-08-31 1979-08-31 Ion plating apparatus for microparts

Publications (1)

Publication Number Publication Date
JPS5635765A true JPS5635765A (en) 1981-04-08

Family

ID=14564472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11156079A Pending JPS5635765A (en) 1979-08-31 1979-08-31 Ion plating apparatus for microparts

Country Status (1)

Country Link
JP (1) JPS5635765A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6292309U (en) * 1985-11-29 1987-06-12
JPH01126410U (en) * 1988-02-20 1989-08-29
JPH0453053U (en) * 1990-09-14 1992-05-06

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6292309U (en) * 1985-11-29 1987-06-12
JPH01126410U (en) * 1988-02-20 1989-08-29
JPH0453053U (en) * 1990-09-14 1992-05-06

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