JPS5641101B2 - - Google Patents
Info
- Publication number
- JPS5641101B2 JPS5641101B2 JP4022574A JP4022574A JPS5641101B2 JP S5641101 B2 JPS5641101 B2 JP S5641101B2 JP 4022574 A JP4022574 A JP 4022574A JP 4022574 A JP4022574 A JP 4022574A JP S5641101 B2 JPS5641101 B2 JP S5641101B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4022574A JPS5641101B2 (de) | 1974-04-09 | 1974-04-09 | |
| DE19752515375 DE2515375A1 (de) | 1974-04-09 | 1975-04-09 | Verfahren zur erzeugung von bildern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4022574A JPS5641101B2 (de) | 1974-04-09 | 1974-04-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50133008A JPS50133008A (de) | 1975-10-21 |
| JPS5641101B2 true JPS5641101B2 (de) | 1981-09-25 |
Family
ID=12574805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4022574A Expired JPS5641101B2 (de) | 1974-04-09 | 1974-04-09 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5641101B2 (de) |
| DE (1) | DE2515375A1 (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54135005A (en) * | 1978-04-12 | 1979-10-19 | Koyo Kagaku Kougiyou Kk | Method of photoengraving |
| DE69130184T2 (de) * | 1990-02-23 | 1999-02-11 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | Verfahren zur Herstellung mehrschichtiger Beschichtungen |
-
1974
- 1974-04-09 JP JP4022574A patent/JPS5641101B2/ja not_active Expired
-
1975
- 1975-04-09 DE DE19752515375 patent/DE2515375A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50133008A (de) | 1975-10-21 |
| DE2515375A1 (de) | 1975-10-23 |