JPS5648176A - Junction field-effect transistor - Google Patents
Junction field-effect transistorInfo
- Publication number
- JPS5648176A JPS5648176A JP12357079A JP12357079A JPS5648176A JP S5648176 A JPS5648176 A JP S5648176A JP 12357079 A JP12357079 A JP 12357079A JP 12357079 A JP12357079 A JP 12357079A JP S5648176 A JPS5648176 A JP S5648176A
- Authority
- JP
- Japan
- Prior art keywords
- region
- island
- fet
- type
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/83—FETs having PN junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To obtain an FET of low input capacitance by separating a semiconduc- tor layer into two island regions, providing a J-FET in one island region, and a diffusion region in the other island region, connecting it with the source region of the FET and extending a drain electrode onto the other island region. CONSTITUTION:On a P type semiconductor substrate 10, an N type layer 20 is epitaxially grown and the layer 20 is separated into two island regions by two P type substrate take-out regions 30 entering into the substrate 10: in one island region, a P type gate region 40, an N<+> type drain region 50 and a source region 60 are made, and thus a J-FET is formed: in the other island region, only an N<+> type region 60' is diffusion formed. Next, an insulating oxide film 90 is formed over the entire surface, windows, are opened, an electrode 80' formed on the region 60' is connected with a source electrode 80 coated on the region 60, a drain electrode 70 formed on the region 50 is extended onto the film 90 approaching the electrode 80', and here provided a pad 70'. By so doing, a low input capacitance J-FET can be obtained without lowering mutual conductance and inversed voltage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12357079A JPS5648176A (en) | 1979-09-26 | 1979-09-26 | Junction field-effect transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12357079A JPS5648176A (en) | 1979-09-26 | 1979-09-26 | Junction field-effect transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5648176A true JPS5648176A (en) | 1981-05-01 |
Family
ID=14863843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12357079A Pending JPS5648176A (en) | 1979-09-26 | 1979-09-26 | Junction field-effect transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5648176A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62243359A (en) * | 1986-04-15 | 1987-10-23 | Matsushita Electric Ind Co Ltd | Compound semiconductor device |
| JPS6334415U (en) * | 1986-08-25 | 1988-03-05 |
-
1979
- 1979-09-26 JP JP12357079A patent/JPS5648176A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62243359A (en) * | 1986-04-15 | 1987-10-23 | Matsushita Electric Ind Co Ltd | Compound semiconductor device |
| JPS6334415U (en) * | 1986-08-25 | 1988-03-05 |
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