JPS5661177A - Preparation of semiconductor photodetector - Google Patents
Preparation of semiconductor photodetectorInfo
- Publication number
- JPS5661177A JPS5661177A JP13715879A JP13715879A JPS5661177A JP S5661177 A JPS5661177 A JP S5661177A JP 13715879 A JP13715879 A JP 13715879A JP 13715879 A JP13715879 A JP 13715879A JP S5661177 A JPS5661177 A JP S5661177A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- type
- photodetector
- film
- islands
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/186—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors having arrangements for blooming suppression
Landscapes
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE:To improve the spatial resolving-power of a semiconductor photodetector by allowing polycrystalline Si layers to separate the epitaxial layer into islands in each of which each element constituting a photodetector is formed. CONSTITUTION:In the surface portions of an N type Si substrate 1, a plurality of P<+> type regions 7 to be underlays for regions separating elements are formed by diffusion and covered with SiO2 films 8. Then, on the whole surface including these, an N type epitaxial layer 9 is grown. This causes polycrystalline Si regions 10 to be produced on the film 8, the regions 10 separating the layer 9 into islands. After that, the whole surface is coated with an SiO2 film 2, in which windows are opened to form in the separated layers 9 P<+> type regions 3-5 by diffusion, which are used as photodetector elements. By this, each barrier comprising the region 7, film 8 and region 10 prevents the minority carriers produced from reaching the adjacent element. Therefore, crosstalk is greatly reduced.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13715879A JPS5661177A (en) | 1979-10-23 | 1979-10-23 | Preparation of semiconductor photodetector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13715879A JPS5661177A (en) | 1979-10-23 | 1979-10-23 | Preparation of semiconductor photodetector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5661177A true JPS5661177A (en) | 1981-05-26 |
Family
ID=15192170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13715879A Pending JPS5661177A (en) | 1979-10-23 | 1979-10-23 | Preparation of semiconductor photodetector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5661177A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5766666A (en) * | 1980-10-13 | 1982-04-22 | Matsushita Electronics Corp | Solid state image pickup device |
| JPS61141177A (en) * | 1984-12-14 | 1986-06-28 | Hamamatsu Photonics Kk | Semiconductor photodetecting device |
| JPS61141175A (en) * | 1984-12-14 | 1986-06-28 | Hamamatsu Photonics Kk | Semiconductor photodetector |
| US4658497A (en) * | 1983-01-03 | 1987-04-21 | Rca Corporation | Method of making an imaging array having a higher sensitivity |
-
1979
- 1979-10-23 JP JP13715879A patent/JPS5661177A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5766666A (en) * | 1980-10-13 | 1982-04-22 | Matsushita Electronics Corp | Solid state image pickup device |
| US4658497A (en) * | 1983-01-03 | 1987-04-21 | Rca Corporation | Method of making an imaging array having a higher sensitivity |
| JPS61141177A (en) * | 1984-12-14 | 1986-06-28 | Hamamatsu Photonics Kk | Semiconductor photodetecting device |
| JPS61141175A (en) * | 1984-12-14 | 1986-06-28 | Hamamatsu Photonics Kk | Semiconductor photodetector |
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