JPS5666000A - Processing method of copper sulfate plating liquid - Google Patents

Processing method of copper sulfate plating liquid

Info

Publication number
JPS5666000A
JPS5666000A JP14198879A JP14198879A JPS5666000A JP S5666000 A JPS5666000 A JP S5666000A JP 14198879 A JP14198879 A JP 14198879A JP 14198879 A JP14198879 A JP 14198879A JP S5666000 A JPS5666000 A JP S5666000A
Authority
JP
Japan
Prior art keywords
plating liquid
copper sulfate
sulfate plating
processing method
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14198879A
Other languages
Japanese (ja)
Other versions
JPS5710199B2 (en
Inventor
Manabu Inoue
Takashi Sakata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Kagaku Sangyo Co Ltd
Original Assignee
Nihon Kagaku Sangyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Kagaku Sangyo Co Ltd filed Critical Nihon Kagaku Sangyo Co Ltd
Priority to JP14198879A priority Critical patent/JPS5666000A/en
Publication of JPS5666000A publication Critical patent/JPS5666000A/en
Publication of JPS5710199B2 publication Critical patent/JPS5710199B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Removal Of Specific Substances (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE: To remove excess chlorine ions efficiently, by adding cuporus oxide to the copper sulfate plating liquid and by filtering the plating liquid.
CONSTITUTION: Cuppous oxide is caused to exist in the copper sulfate plating liquid to form insoluble chloride, and the plating liquid is filtered to remove excess chlorine ions in the plating liquid. As a result, unnecessary metallic ions are not accumulated, and the harmful mist accompanied with hydrogen generation is not generated. Further, the brightener is not decomposed, and this method is advantageous to economization.
COPYRIGHT: (C)1981,JPO&Japio
JP14198879A 1979-11-05 1979-11-05 Processing method of copper sulfate plating liquid Granted JPS5666000A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14198879A JPS5666000A (en) 1979-11-05 1979-11-05 Processing method of copper sulfate plating liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14198879A JPS5666000A (en) 1979-11-05 1979-11-05 Processing method of copper sulfate plating liquid

Publications (2)

Publication Number Publication Date
JPS5666000A true JPS5666000A (en) 1981-06-04
JPS5710199B2 JPS5710199B2 (en) 1982-02-25

Family

ID=15304777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14198879A Granted JPS5666000A (en) 1979-11-05 1979-11-05 Processing method of copper sulfate plating liquid

Country Status (1)

Country Link
JP (1) JPS5666000A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107663638A (en) * 2016-07-30 2018-02-06 湖北永绍科技股份有限公司 A kind of method for reducing chlorine ion concentration in acidiccopper plating liquid

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107663638A (en) * 2016-07-30 2018-02-06 湖北永绍科技股份有限公司 A kind of method for reducing chlorine ion concentration in acidiccopper plating liquid

Also Published As

Publication number Publication date
JPS5710199B2 (en) 1982-02-25

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