JPS5681982A - Power phototransistor - Google Patents
Power phototransistorInfo
- Publication number
- JPS5681982A JPS5681982A JP15949579A JP15949579A JPS5681982A JP S5681982 A JPS5681982 A JP S5681982A JP 15949579 A JP15949579 A JP 15949579A JP 15949579 A JP15949579 A JP 15949579A JP S5681982 A JPS5681982 A JP S5681982A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- comblike
- phototransistor
- emitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/24—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only two potential barriers, e.g. bipolar phototransistors
- H10F30/245—Bipolar phototransistors
Landscapes
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To obtain a high collector output for a power phototransistor by forming comblike base region on a semiconductor substrate, forming a comblike emitter region therein, as a power phototransistor, and forming an impurity high density region having the same conductivity type as the base region and higher density than this between the emitter regions. CONSTITUTION:The comblike P type base region 11 is diffused in the region 10b of a collector semiconductor substrate 10 having N type region 10b in the upper portion and N<+> type region 10a in the lower part, and the comblike N<+> type emitter region 12 is similarly formed therein. Then, an insulating film 14 is covered on the entire surface, a window is perforated thereat, a base pickup electrode 15 is mounted at the region 11, and an emitter pickup electrode 16 is mounted at the region 12, as a planar type power phototransistor. With this configuration, a shallow P<+> type region 13 is added to the surface layer of the region 10b between the regions 12. Thus, the incident light amount is increased, the quantum efficiency is also enhanced, thereby increasing the collector output.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15949579A JPS5681982A (en) | 1979-12-08 | 1979-12-08 | Power phototransistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15949579A JPS5681982A (en) | 1979-12-08 | 1979-12-08 | Power phototransistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5681982A true JPS5681982A (en) | 1981-07-04 |
Family
ID=15695009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15949579A Pending JPS5681982A (en) | 1979-12-08 | 1979-12-08 | Power phototransistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5681982A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6471185A (en) * | 1987-09-11 | 1989-03-16 | Canon Kk | Photoelectric conversion device |
| JPH03185878A (en) * | 1989-12-15 | 1991-08-13 | Canon Inc | Photoelectric conversion device |
| US5483096A (en) * | 1991-11-07 | 1996-01-09 | Seiko Instruments Inc. | Photo sensor |
| JP2009033043A (en) * | 2007-07-30 | 2009-02-12 | Panasonic Corp | Optical semiconductor device |
| WO2019185787A1 (en) * | 2018-03-29 | 2019-10-03 | Vishay Semiconductor Gmbh | Photosensitive semiconductor component, method for forming a photosensitive semiconductor component |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53112682A (en) * | 1977-03-14 | 1978-10-02 | Mitsubishi Electric Corp | Photo thyristor |
| JPS5455189A (en) * | 1977-10-11 | 1979-05-02 | Nippon Telegr & Teleph Corp <Ntt> | Photo transistor |
-
1979
- 1979-12-08 JP JP15949579A patent/JPS5681982A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53112682A (en) * | 1977-03-14 | 1978-10-02 | Mitsubishi Electric Corp | Photo thyristor |
| JPS5455189A (en) * | 1977-10-11 | 1979-05-02 | Nippon Telegr & Teleph Corp <Ntt> | Photo transistor |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6471185A (en) * | 1987-09-11 | 1989-03-16 | Canon Kk | Photoelectric conversion device |
| JPH03185878A (en) * | 1989-12-15 | 1991-08-13 | Canon Inc | Photoelectric conversion device |
| US5483096A (en) * | 1991-11-07 | 1996-01-09 | Seiko Instruments Inc. | Photo sensor |
| JP2009033043A (en) * | 2007-07-30 | 2009-02-12 | Panasonic Corp | Optical semiconductor device |
| WO2019185787A1 (en) * | 2018-03-29 | 2019-10-03 | Vishay Semiconductor Gmbh | Photosensitive semiconductor component, method for forming a photosensitive semiconductor component |
| CN111902950A (en) * | 2018-03-29 | 2020-11-06 | 威世半导体有限公司 | Photosensitive semiconductor device and method of forming the same |
| KR20200134316A (en) * | 2018-03-29 | 2020-12-01 | 비쉐이 세미컨덕터 게엠베하 | Photosensitive semiconductor component, method of forming photosensitive semiconductor component |
| JP2021519519A (en) * | 2018-03-29 | 2021-08-10 | ヴィシャイ セミコンダクター ゲゼルシャフト ミット ベシュレンクテル ハフツングVishay Semiconductor GmbH | Photosensitive semiconductor parts and methods for forming photosensitive semiconductor parts |
| US11876144B2 (en) | 2018-03-29 | 2024-01-16 | Vishay Semiconductor Gmbh | Photosensitive semiconductor component, method for forming a photosensitive semiconductor component |
| CN111902950B (en) * | 2018-03-29 | 2025-01-21 | 威世半导体有限公司 | Photosensitive semiconductor device and method for forming a photosensitive semiconductor device |
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