JPS5687807A - Detecting method of mark - Google Patents
Detecting method of markInfo
- Publication number
- JPS5687807A JPS5687807A JP16445679A JP16445679A JPS5687807A JP S5687807 A JPS5687807 A JP S5687807A JP 16445679 A JP16445679 A JP 16445679A JP 16445679 A JP16445679 A JP 16445679A JP S5687807 A JPS5687807 A JP S5687807A
- Authority
- JP
- Japan
- Prior art keywords
- mark
- computer
- sample
- rise time
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
PURPOSE: To obtain the centroid position of a mark speedily and highly accurately by computing the rise time and the fall time of the mark detection.
CONSTITUTION: From a computer 21, the beam deflection control data for scanning a circular mark by an electron beam is supplied to a beam controller 19, which controls deflecting coils 13W15 so that the electron beam from an electron gun 11 scans a sample 16 in the x-y directions. The wave reflected from the sample 16 is detected by a photomultiplier 18 and inputted to a signal processing circuit 20, which detects the rise time and the fall time of the mark detection and inputs them to the computer 21. Based on said times, the computer 21 checks the mark position.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16445679A JPS5687807A (en) | 1979-12-18 | 1979-12-18 | Detecting method of mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16445679A JPS5687807A (en) | 1979-12-18 | 1979-12-18 | Detecting method of mark |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5687807A true JPS5687807A (en) | 1981-07-16 |
Family
ID=15793515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16445679A Pending JPS5687807A (en) | 1979-12-18 | 1979-12-18 | Detecting method of mark |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5687807A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5136303A (en) * | 1990-02-20 | 1992-08-04 | Nippon Telegraph And Telephone Corporation | Wrist watch type receiver |
-
1979
- 1979-12-18 JP JP16445679A patent/JPS5687807A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5136303A (en) * | 1990-02-20 | 1992-08-04 | Nippon Telegraph And Telephone Corporation | Wrist watch type receiver |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS56132505A (en) | Position detecting method | |
| JPS5633830A (en) | Detecting method for mark positioning by electron beam | |
| US4539481A (en) | Method for adjusting a reference signal for a laser device operating in a giant pulse mode | |
| JPS5753938A (en) | Electron beam exposure apparatus | |
| JPS5621321A (en) | Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus | |
| JPS5687807A (en) | Detecting method of mark | |
| JPS5694630A (en) | Etching method using ion-beam | |
| JP3243916B2 (en) | Circular pattern measurement and position recognition device | |
| US4661702A (en) | Primary ion beam raster gating technique for secondary ion mass spectrometer system | |
| JPS57210549A (en) | Method of correction attendant on deflection | |
| JPS567429A (en) | Patterning device | |
| JPS5541668A (en) | Detecting method of character position | |
| JPS58200536A (en) | Detecting system for mark in charge-beam exposure device | |
| JPS5694629A (en) | Etching method using ion-beam | |
| JPS54105972A (en) | Electron beam exposure device | |
| JP2715507B2 (en) | Substrate inspection system using electron beam | |
| JPS5654041A (en) | Electron beam exposure device | |
| JPS61193443A (en) | Detection of positioning mask | |
| JPS55140149A (en) | Supersonic wave flaw detector | |
| JPH04127416A (en) | Position detection method of mark | |
| JPS54140836A (en) | Information reader | |
| JPS57136753A (en) | Stroboscopic scanning electron microscope | |
| JPS60205607A (en) | Electron beam working machine | |
| JPS5315076A (en) | Electron beam position detection method | |
| JPS55151207A (en) | Detecting method for reference mark position by electron beam exposure |