JPS5696076A - Formation of metallic mask for ion etching - Google Patents

Formation of metallic mask for ion etching

Info

Publication number
JPS5696076A
JPS5696076A JP17099379A JP17099379A JPS5696076A JP S5696076 A JPS5696076 A JP S5696076A JP 17099379 A JP17099379 A JP 17099379A JP 17099379 A JP17099379 A JP 17099379A JP S5696076 A JPS5696076 A JP S5696076A
Authority
JP
Japan
Prior art keywords
coating
worked
ion etching
mask
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17099379A
Other languages
Japanese (ja)
Other versions
JPS6227156B2 (en
Inventor
Tomio Kume
Shoichi Tsutsumi
Seiji Yoneoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17099379A priority Critical patent/JPS5696076A/en
Publication of JPS5696076A publication Critical patent/JPS5696076A/en
Publication of JPS6227156B2 publication Critical patent/JPS6227156B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE: To form titled mask which is capable of forming precision pattern and is excellent in peeling resistance, by forming adhered coating of Al, Al alloy, or Cr etc. on the material made of metallic oxide which is to be worked, then by using lift-off method.
CONSTITUTION: Adhered coating 2 made of Al, Al alloy, or other metal having high affinity for oxygen is formed on the material to be worked 1 made of metallic oxide such as photoceram, or ferrite. Then the material is prebaked by spin coating with suitable resist and postbaked by exposure and development according to a suitable pattern to form resist coating 3. Layers 4, 4a made of metal such as Ti etc. and thinner than the coating 3 are formed. The whole material 1 to be worked is immersed in a solvent in orde to remove coatings 3 and 4 simultaneously, hereby mask 4a of desired form is formed on the material 1 to be worked with interposition of said adhered coating 2. The member 4a is hardly peeled during ion etching.
COPYRIGHT: (C)1981,JPO&Japio
JP17099379A 1979-12-28 1979-12-28 Formation of metallic mask for ion etching Granted JPS5696076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17099379A JPS5696076A (en) 1979-12-28 1979-12-28 Formation of metallic mask for ion etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17099379A JPS5696076A (en) 1979-12-28 1979-12-28 Formation of metallic mask for ion etching

Publications (2)

Publication Number Publication Date
JPS5696076A true JPS5696076A (en) 1981-08-03
JPS6227156B2 JPS6227156B2 (en) 1987-06-12

Family

ID=15915122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17099379A Granted JPS5696076A (en) 1979-12-28 1979-12-28 Formation of metallic mask for ion etching

Country Status (1)

Country Link
JP (1) JPS5696076A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52125431A (en) * 1976-04-15 1977-10-21 Fujitsu Ltd Dry etching method
JPS5432143A (en) * 1977-08-17 1979-03-09 Hitachi Ltd Etching process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52125431A (en) * 1976-04-15 1977-10-21 Fujitsu Ltd Dry etching method
JPS5432143A (en) * 1977-08-17 1979-03-09 Hitachi Ltd Etching process

Also Published As

Publication number Publication date
JPS6227156B2 (en) 1987-06-12

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