JPS57100730A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS57100730A
JPS57100730A JP17791880A JP17791880A JPS57100730A JP S57100730 A JPS57100730 A JP S57100730A JP 17791880 A JP17791880 A JP 17791880A JP 17791880 A JP17791880 A JP 17791880A JP S57100730 A JPS57100730 A JP S57100730A
Authority
JP
Japan
Prior art keywords
photoresist
semiconductor substrate
main surface
outer edge
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17791880A
Other languages
Japanese (ja)
Inventor
Yoshio Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP17791880A priority Critical patent/JPS57100730A/en
Publication of JPS57100730A publication Critical patent/JPS57100730A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent in advance an accident caused by a photoresist during the step of manufacturing semiconductor by removing the photoresist introduced from the outer edge of a semiconductor substrate to the inside in the prescribed width. CONSTITUTION:A light shielding plate 3 for preventing the exposure of a light source lamp 1 in the width of 1-5mm. from the outer edge of the main surface of a semiconductor substrate 7 is mounted at the adequate position in the exposure device used by a photoetching method, and a photoresist 6 is removed. In this manner, an accident of disturbing the free drop of the photoresist due to its adhesive or adhering to the main surface of a semiconductor substrate can be prevented in the step of isolating and scattering the photoresist pattern in the vicinity of the end of the substrate.
JP17791880A 1980-12-16 1980-12-16 Manufacture of semiconductor device Pending JPS57100730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17791880A JPS57100730A (en) 1980-12-16 1980-12-16 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17791880A JPS57100730A (en) 1980-12-16 1980-12-16 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS57100730A true JPS57100730A (en) 1982-06-23

Family

ID=16039336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17791880A Pending JPS57100730A (en) 1980-12-16 1980-12-16 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS57100730A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59158520A (en) * 1983-02-28 1984-09-08 Toshiba Corp Irradiating device
JPS6060724A (en) * 1983-09-14 1985-04-08 Toshiba Corp Semiconductor exposing device
JPS60118235U (en) * 1984-01-17 1985-08-09 ロ−ム株式会社 face wash toilet
US6040951A (en) * 1990-08-16 2000-03-21 Canon Kabushiki Kaisha Optical apparatus having hard circuit board encoder

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59158520A (en) * 1983-02-28 1984-09-08 Toshiba Corp Irradiating device
JPS6060724A (en) * 1983-09-14 1985-04-08 Toshiba Corp Semiconductor exposing device
JPS60118235U (en) * 1984-01-17 1985-08-09 ロ−ム株式会社 face wash toilet
US6040951A (en) * 1990-08-16 2000-03-21 Canon Kabushiki Kaisha Optical apparatus having hard circuit board encoder

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