JPS57147633A - Plate for photomask - Google Patents

Plate for photomask

Info

Publication number
JPS57147633A
JPS57147633A JP3243481A JP3243481A JPS57147633A JP S57147633 A JPS57147633 A JP S57147633A JP 3243481 A JP3243481 A JP 3243481A JP 3243481 A JP3243481 A JP 3243481A JP S57147633 A JPS57147633 A JP S57147633A
Authority
JP
Japan
Prior art keywords
glass substrate
alkali metal
tin oxide
metal elements
conductive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3243481A
Other languages
Japanese (ja)
Other versions
JPS6161664B2 (en
Inventor
Masaaki Ozeki
Kotaro Kasama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Hoya Electronics Corp
Original Assignee
Hoya Corp
Hoya Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Corp filed Critical Hoya Corp
Priority to JP3243481A priority Critical patent/JPS57147633A/en
Publication of JPS57147633A publication Critical patent/JPS57147633A/en
Publication of JPS6161664B2 publication Critical patent/JPS6161664B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To improve the adhesive strength of a conductive film and improve the acid resistance to extend rhe life of a mask, by specifying the quantity of alkali metal elements and the forming method for tin oxide in a plate for photomask with a transparent conductive film. CONSTITUTION:A transparent conductive film 2 consisting essentially of tin oxide is formed on a transparent glass substrate 1 including >=3mol% alkali metal elements in their oxides by sputtering or ion plating. Otherwise, the transparent conductive film 2 consisting essentially of tin oxide is provided on the transparent glass substrate 1, which does not include alkali metal elements practically, by vacuum vapor-deposition. Thus, the degradation of the adhesive strength between the glass substrate and tin oxide caused by alkali metal elements in the glass substrate is prevented, and the film is not exfoliated and the conduction is not lost when this plate is washed with an oxidizing concentrated sulfric acid after a chromium film 3 or the like is formed, thus extending the life of the mask.
JP3243481A 1981-03-09 1981-03-09 Plate for photomask Granted JPS57147633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3243481A JPS57147633A (en) 1981-03-09 1981-03-09 Plate for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3243481A JPS57147633A (en) 1981-03-09 1981-03-09 Plate for photomask

Publications (2)

Publication Number Publication Date
JPS57147633A true JPS57147633A (en) 1982-09-11
JPS6161664B2 JPS6161664B2 (en) 1986-12-26

Family

ID=12358838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3243481A Granted JPS57147633A (en) 1981-03-09 1981-03-09 Plate for photomask

Country Status (1)

Country Link
JP (1) JPS57147633A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033556A (en) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd Material of photomask for dry etching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033556A (en) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd Material of photomask for dry etching

Also Published As

Publication number Publication date
JPS6161664B2 (en) 1986-12-26

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