JPS57169087A - Vacuum vapor-deposition device of crystal resonator - Google Patents

Vacuum vapor-deposition device of crystal resonator

Info

Publication number
JPS57169087A
JPS57169087A JP5405081A JP5405081A JPS57169087A JP S57169087 A JPS57169087 A JP S57169087A JP 5405081 A JP5405081 A JP 5405081A JP 5405081 A JP5405081 A JP 5405081A JP S57169087 A JPS57169087 A JP S57169087A
Authority
JP
Japan
Prior art keywords
vapor
shielding plate
deposition
evaporated
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5405081A
Other languages
Japanese (ja)
Other versions
JPH021226B2 (en
Inventor
Toshio Hayashi
Yasuo Nomura
Toshiki Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP5405081A priority Critical patent/JPS57169087A/en
Publication of JPS57169087A publication Critical patent/JPS57169087A/en
Publication of JPH021226B2 publication Critical patent/JPH021226B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To simplify a work process and to prevent damage of a quartz piece, by placing plural crystal pieces in the same vacuum vapor-deposition chamber, simultaneously executing basic plating for an energizing electrode, and subsequently, adjusting the frequency in order one by one in its state. CONSTITUTION:A sample is installed to each installing member 43a-43f of a vacuum vapor-deposition chamber 22, and a metal to be evaporated is stored in an evaporation source 57. Holes 40a-40f of the second vapor-depositing part shielding plate 39 are made to correspond to holes 26a-26f of the first vapor-depositing part shielding plate 25 by rotating a rotary member 30 by a motor 38. The metal is evaporated by electrifying the evaporation source 57, and vapor-deposition is executed to the sample simultaneously. The sample is rotated in reverse by releasing the electrification, rotating the rotary member 30 by 7 rotations by the motor 38, and rotating the installing members 43a-43f. The basic vapor-deposition ends by executing the vapor-deposition once again. Subsequently, the rotary member 30 is rotated by 1/12 rotation by the motor 38, one of the holes 40a-40f of the shielding plate 39 is made to correspond to an adjusting hole 29 of the shielding plate 25, a very small quantity of metal is evaporated from the evaporation source 57, the frequency is adjusted, and its adjustment is executed in order one by one.
JP5405081A 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator Granted JPS57169087A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5405081A JPS57169087A (en) 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5405081A JPS57169087A (en) 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator

Publications (2)

Publication Number Publication Date
JPS57169087A true JPS57169087A (en) 1982-10-18
JPH021226B2 JPH021226B2 (en) 1990-01-10

Family

ID=12959776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5405081A Granted JPS57169087A (en) 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator

Country Status (1)

Country Link
JP (1) JPS57169087A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61179496A (en) * 1984-07-31 1986-08-12 カシオ計算機株式会社 Waveform generation system for electronic musical instrument
JP2011210495A (en) * 2010-03-29 2011-10-20 Seiko Instruments Inc Electrochemical cell with terminal and its manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61179496A (en) * 1984-07-31 1986-08-12 カシオ計算機株式会社 Waveform generation system for electronic musical instrument
JP2011210495A (en) * 2010-03-29 2011-10-20 Seiko Instruments Inc Electrochemical cell with terminal and its manufacturing method

Also Published As

Publication number Publication date
JPH021226B2 (en) 1990-01-10

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