JPS571792A - Desensitizing liquid for lithographic plate - Google Patents
Desensitizing liquid for lithographic plateInfo
- Publication number
- JPS571792A JPS571792A JP7477480A JP7477480A JPS571792A JP S571792 A JPS571792 A JP S571792A JP 7477480 A JP7477480 A JP 7477480A JP 7477480 A JP7477480 A JP 7477480A JP S571792 A JPS571792 A JP S571792A
- Authority
- JP
- Japan
- Prior art keywords
- lithographic plate
- liquid
- weight
- amount
- desensitizing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title abstract 4
- -1 acetylene alcohol Chemical compound 0.000 abstract 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract 4
- 238000000586 desensitisation Methods 0.000 abstract 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 2
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
PURPOSE: To obtain a printed matter without scumming, by adding an acetylene alcohol or an acetylene glycol to a desensitizing liquid so that it becomes compatible with a lithographic plate and the desensitization treatment can be completely carried out.
CONSTITUTION: The desensitizing liquid is added with an acetylene alcohol or an acetylene glycol in an amount of preferably 0.05W1% by weight, and the desensitization treatment is carried out using the liquid. If the amount is less than 0.05% by weight, the effect improving wettability with the surface of the lithographic plate and to lessen the scumming on a printed matter will be feeble, while if the amount is more than 1% by weight, the effect will be saturated.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7477480A JPS571792A (en) | 1980-06-03 | 1980-06-03 | Desensitizing liquid for lithographic plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7477480A JPS571792A (en) | 1980-06-03 | 1980-06-03 | Desensitizing liquid for lithographic plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS571792A true JPS571792A (en) | 1982-01-06 |
| JPS647599B2 JPS647599B2 (en) | 1989-02-09 |
Family
ID=13556964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7477480A Granted JPS571792A (en) | 1980-06-03 | 1980-06-03 | Desensitizing liquid for lithographic plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS571792A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02501095A (en) * | 1987-07-30 | 1990-04-12 | ヒューズ―ジェイブイシー・テクノロジー・コーポレーション | Silicon-on-sapphire liquid crystal light valve and method |
| JPH02297492A (en) * | 1989-05-12 | 1990-12-07 | Fuji Photo Film Co Ltd | Plate surface protection agent for lithography printing plate |
-
1980
- 1980-06-03 JP JP7477480A patent/JPS571792A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02501095A (en) * | 1987-07-30 | 1990-04-12 | ヒューズ―ジェイブイシー・テクノロジー・コーポレーション | Silicon-on-sapphire liquid crystal light valve and method |
| JPH02297492A (en) * | 1989-05-12 | 1990-12-07 | Fuji Photo Film Co Ltd | Plate surface protection agent for lithography printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS647599B2 (en) | 1989-02-09 |
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