JPS57192954A - Surface processing method - Google Patents

Surface processing method

Info

Publication number
JPS57192954A
JPS57192954A JP56078358A JP7835881A JPS57192954A JP S57192954 A JPS57192954 A JP S57192954A JP 56078358 A JP56078358 A JP 56078358A JP 7835881 A JP7835881 A JP 7835881A JP S57192954 A JPS57192954 A JP S57192954A
Authority
JP
Japan
Prior art keywords
wafer
light
wavelength
signal
photodetector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56078358A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0155447B2 (da
Inventor
Mikio Shoda
Nobutoshi Ogami
Yoshio Nomura
Yasuhiro Kurata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP56078358A priority Critical patent/JPS57192954A/ja
Publication of JPS57192954A publication Critical patent/JPS57192954A/ja
Publication of JPH0155447B2 publication Critical patent/JPH0155447B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • H10P74/238—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56078358A 1981-05-23 1981-05-23 Surface processing method Granted JPS57192954A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56078358A JPS57192954A (en) 1981-05-23 1981-05-23 Surface processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56078358A JPS57192954A (en) 1981-05-23 1981-05-23 Surface processing method

Publications (2)

Publication Number Publication Date
JPS57192954A true JPS57192954A (en) 1982-11-27
JPH0155447B2 JPH0155447B2 (da) 1989-11-24

Family

ID=13659759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56078358A Granted JPS57192954A (en) 1981-05-23 1981-05-23 Surface processing method

Country Status (1)

Country Link
JP (1) JPS57192954A (da)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6216523A (ja) * 1985-07-16 1987-01-24 Toshiba Corp レジストパタ−ンの現像方法および現像装置
JPS62193247A (ja) * 1986-02-20 1987-08-25 Fujitsu Ltd 現像終点決定方法
JPS6412529A (en) * 1987-07-07 1989-01-17 Sumitomo Gca Kk Development of wafer
JP2003332299A (ja) * 2002-04-12 2003-11-21 Dns Korea Co Ltd 厚さ測定システムが具備された回転エッチング装置
WO2023042487A1 (ja) * 2021-09-16 2023-03-23 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5120676A (en) * 1974-08-14 1976-02-19 Dainippon Printing Co Ltd Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi
JPS5197380A (da) * 1975-02-21 1976-08-26

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5120676A (en) * 1974-08-14 1976-02-19 Dainippon Printing Co Ltd Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi
JPS5197380A (da) * 1975-02-21 1976-08-26

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6216523A (ja) * 1985-07-16 1987-01-24 Toshiba Corp レジストパタ−ンの現像方法および現像装置
JPS62193247A (ja) * 1986-02-20 1987-08-25 Fujitsu Ltd 現像終点決定方法
JPS6412529A (en) * 1987-07-07 1989-01-17 Sumitomo Gca Kk Development of wafer
JP2003332299A (ja) * 2002-04-12 2003-11-21 Dns Korea Co Ltd 厚さ測定システムが具備された回転エッチング装置
WO2023042487A1 (ja) * 2021-09-16 2023-03-23 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP2023043679A (ja) * 2021-09-16 2023-03-29 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Also Published As

Publication number Publication date
JPH0155447B2 (da) 1989-11-24

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