JPS57194529A - Electron beam exposing device - Google Patents

Electron beam exposing device

Info

Publication number
JPS57194529A
JPS57194529A JP56079252A JP7925281A JPS57194529A JP S57194529 A JPS57194529 A JP S57194529A JP 56079252 A JP56079252 A JP 56079252A JP 7925281 A JP7925281 A JP 7925281A JP S57194529 A JPS57194529 A JP S57194529A
Authority
JP
Japan
Prior art keywords
exposed
optical axis
electron beam
light
deflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56079252A
Other languages
Japanese (ja)
Inventor
Shigeo Konno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP56079252A priority Critical patent/JPS57194529A/en
Publication of JPS57194529A publication Critical patent/JPS57194529A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable to take an accurate positional measurement of the material to be exposed as well as to contrive shortening of the total time required for exposure by a method wherein a position measuring device is arranged against the material to be exposed on the reverse side of the electron beam irradiation in the direction of optical axis. CONSTITUTION:The electron beam irradiated from an electron gun 5 passes through a focusing lens 6, a projection lens 7 and a deflector 9, and irradiated on the material to be exposed 8 such as a dry plate and the like on a stage 11 which is movable in horizontal direction. A position measuring probe 12 is arranged on an optical axis 4. The probe 12 consists of the glass fibers for light projection and light receiving, the reflection of the light emitted by a light source 15 is measured by a light detector 16, the results of which are processed by a central processing device 10, the position of the material to be exposed 8 is found out, and the projection lens 7 and the deflector 9 are adjusted. Accordingly, as an accurate measurement can be performed on the exposable part, whereon the material to be exposed 8 and the optical axis will be intersected, without shifting the stage, and the exposing work can be performed while positional adjustment is being performed, thereby enabling to shorten the time required for exposure.
JP56079252A 1981-05-27 1981-05-27 Electron beam exposing device Pending JPS57194529A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56079252A JPS57194529A (en) 1981-05-27 1981-05-27 Electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56079252A JPS57194529A (en) 1981-05-27 1981-05-27 Electron beam exposing device

Publications (1)

Publication Number Publication Date
JPS57194529A true JPS57194529A (en) 1982-11-30

Family

ID=13684655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56079252A Pending JPS57194529A (en) 1981-05-27 1981-05-27 Electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS57194529A (en)

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