JPS5719949A - Dual filament ion source - Google Patents

Dual filament ion source

Info

Publication number
JPS5719949A
JPS5719949A JP9272880A JP9272880A JPS5719949A JP S5719949 A JPS5719949 A JP S5719949A JP 9272880 A JP9272880 A JP 9272880A JP 9272880 A JP9272880 A JP 9272880A JP S5719949 A JPS5719949 A JP S5719949A
Authority
JP
Japan
Prior art keywords
filament
ion source
dual filament
spare
filament ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9272880A
Other languages
Japanese (ja)
Inventor
Kazuo Chitoku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9272880A priority Critical patent/JPS5719949A/en
Publication of JPS5719949A publication Critical patent/JPS5719949A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To attain the long life by arranging a spare filament instead of an electron collector. CONSTITUTION:A spare filament 3' and grid 4 are attached instead of an electron collector, and a chamber voltage is applied to make it serve as a dual filament ion source. The selection between the filament 3 and the spare filament 3' is conducted by switching the power source.
JP9272880A 1980-07-09 1980-07-09 Dual filament ion source Pending JPS5719949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9272880A JPS5719949A (en) 1980-07-09 1980-07-09 Dual filament ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9272880A JPS5719949A (en) 1980-07-09 1980-07-09 Dual filament ion source

Publications (1)

Publication Number Publication Date
JPS5719949A true JPS5719949A (en) 1982-02-02

Family

ID=14062482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9272880A Pending JPS5719949A (en) 1980-07-09 1980-07-09 Dual filament ion source

Country Status (1)

Country Link
JP (1) JPS5719949A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005045877A1 (en) * 2003-10-31 2005-05-19 Saintech Pty Ltd Dual filament ion source
US7429863B2 (en) 2006-07-18 2008-09-30 Brooks Automation, Inc. Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments
WO2009100073A3 (en) * 2008-02-05 2009-11-19 Thermo Finnigan Llc Method and apparatus for normalizing performance of an electron source
JP2012520542A (en) * 2009-03-11 2012-09-06 アデイクセン・バキユーム・プロダクト Ionization cell for mass spectrometer and corresponding leak detector

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005045877A1 (en) * 2003-10-31 2005-05-19 Saintech Pty Ltd Dual filament ion source
US7429863B2 (en) 2006-07-18 2008-09-30 Brooks Automation, Inc. Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments
US7656165B2 (en) 2006-07-18 2010-02-02 Brooks Automation, Inc. Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments
WO2009100073A3 (en) * 2008-02-05 2009-11-19 Thermo Finnigan Llc Method and apparatus for normalizing performance of an electron source
JP2012520542A (en) * 2009-03-11 2012-09-06 アデイクセン・バキユーム・プロダクト Ionization cell for mass spectrometer and corresponding leak detector

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