JPS57201021A - Electron ray drawing apparatus - Google Patents

Electron ray drawing apparatus

Info

Publication number
JPS57201021A
JPS57201021A JP56085787A JP8578781A JPS57201021A JP S57201021 A JPS57201021 A JP S57201021A JP 56085787 A JP56085787 A JP 56085787A JP 8578781 A JP8578781 A JP 8578781A JP S57201021 A JPS57201021 A JP S57201021A
Authority
JP
Japan
Prior art keywords
current
variation
specimen
voltage
comparator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56085787A
Other languages
Japanese (ja)
Inventor
Soichiro Hayashi
Hideyuki Kakiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56085787A priority Critical patent/JPS57201021A/en
Publication of JPS57201021A publication Critical patent/JPS57201021A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To rapidly control the detection of the variation and reduction of an actually drawing picture current in an electron beam drawing apparatus by detecting the variation and reduction of the current by utilizing the difference of the route of a current due to a discharge and a specimen current measuring circuit. CONSTITUTION:A specimen base 9 is not grounded, a current flowing in case of drawing is applied from the base 9 to a current amplifier 10, and is converted to a voltage. The voltage is fed via an A/D converter 14 into a controller 26 (which sets a reference voltage 16). When a specimen 20 is then drawn, an actually drawing current is converted via the amplifier 10 into a signal current 13, is then inputted to a comparator 15, which compares the signal with a set reference voltage value 16, thereby monitoring the variation in the picture current. The output of the comparator 15 is supplied through a controller 27 to a high voltage power source 19, thereby controlling the high voltage.
JP56085787A 1981-06-05 1981-06-05 Electron ray drawing apparatus Pending JPS57201021A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56085787A JPS57201021A (en) 1981-06-05 1981-06-05 Electron ray drawing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56085787A JPS57201021A (en) 1981-06-05 1981-06-05 Electron ray drawing apparatus

Publications (1)

Publication Number Publication Date
JPS57201021A true JPS57201021A (en) 1982-12-09

Family

ID=13868592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56085787A Pending JPS57201021A (en) 1981-06-05 1981-06-05 Electron ray drawing apparatus

Country Status (1)

Country Link
JP (1) JPS57201021A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207339A (en) * 1981-06-16 1982-12-20 Fujitsu Ltd Electron beam exposure device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140982A (en) * 1974-10-02 1976-04-06 Nippon Electron Optics Lab Denshipuroobusochi niokeru biimuanteikasochi

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140982A (en) * 1974-10-02 1976-04-06 Nippon Electron Optics Lab Denshipuroobusochi niokeru biimuanteikasochi

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207339A (en) * 1981-06-16 1982-12-20 Fujitsu Ltd Electron beam exposure device

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